Focused electron beam induced deposition (FEBID) is a single-step, direct-write
nanofabrication technique capable of writing three-dimensional metal-containing nanoscale …

Background: Focused electron beam induced deposition (FEBID) is a direct-writing
technique with nanometer resolution, which has received strongly increasing attention within …

Extreme ultraviolet (EUV) lithography (13.5 nm) is the newest technology that allows high-
throughput fabrication of electronic circuitry in the sub-20 nm scale. It is commonly assumed …

Controlling the outcome of reactions is a central issue of chemical research. Physical tools
can achieve this if they are able to precisely dissociate specific bonds of a molecule …

We report absolute dissociative electron attachment (DEA) and dissociative ionization (DI)
cross sections for electron scattering from the focused electron beam induced deposition …

Low-energy electrons (LEEs) play an important role in nanolithography, atmospheric
chemistry, and DNA radiation damage. Previously, the cleavage of specific chemical bonds …

Focused electron beam-induced deposition (FEBID) and focused ion beam-induced
deposition (FIBID) are direct-write fabrication techniques that use focused beams of charged …

Relative cross sections for dissociative electron attachment (DEA) and dissociative
ionization (DI) of the FEBID precursor, trimethyl (methylcyclopentadienyl) platinum (IV) …

Tungsten hexacarbonyl (W (CO) 6) is frequently used as an organometallic precursor to
create metal-containing nanostructures in electron beam induced deposition (EBID) …

This study focuses on elucidating the bond breaking steps involved in the electron beam
induced deposition (EBID) of nanostructures created from the organometallic precursor …