Gate dielectrics integration for 2D electronics: challenges, advances, and outlook

S Yang, K Liu, Y Xu, L Liu, H Li, T Zhai - Advanced Materials, 2023 - Wiley Online Library
Abstract 2D semiconductors have emerged both as an ideal platform for fundamental
studies and as promising channel materials in beyond‐silicon field‐effect‐transistors due to …

High‐Performance CMOS Inverter Array with Monolithic 3D Architecture Based on CVD‐Grown n‐MoS2 and p‐MoTe2

X Jia, Z Cheng, B Han, X Cheng, Q Wang, Y Ran, W Xu… - Small, 2023 - Wiley Online Library
In this work, monolithic three‐dimensional complementary metal oxide semiconductor
(CMOS) inverter array has been fabricated, based on large‐scale n‐MoS2 and p‐MoTe2 …

Atomic layer deposited Pt nanoparticles on functionalized MoS2 as highly sensitive H2 sensor

S Lee, Y Kang, J Lee, J Kim, JW Shin, S Sim, D Go… - Applied Surface …, 2022 - Elsevier
Hydrogen gas (H 2) has garnered significant attention as an alternative clean energy
source, and its sensitive detection is essential to prevent explosions due to leakage in …

Impact of ZrO2 Dielectrics Thickness on Electrical Performance of TiO2 Thin Film Transistors with Sub-2 V Operation

J Zhang, M Jia, MG Sales, Y Zhao, G Lin… - ACS Applied …, 2021 - ACS Publications
In the present work, the impact of ZrO2 gate dielectric thickness on the electrical
performance of TiO2 thin film transistors (TFTs) is systematically investigated. Exhaustive …

High-performance MoS2 phototransistors with Hf1–x Al x O back-gate dielectric layer grown by plasma enhanced atomic layer deposition

QJ Yu, XX Li, YC Li, ST Ding, T Huang, ZY Gu… - …, 2024 - iopscience.iop.org
Molybdenum sulfide (MoS 2) as an emerging optoelectronic material, shows great potential
for phototransistors owing to its atomic thickness, adjustable band gap, and low cost …

Tailored Air Annealing Strategy to Promote the Photoelectric Performance of AZO-Based Multilayer Films

S Gao, L Li, Y Tang, P Yang - Crystal Growth & Design, 2024 - ACS Publications
We investigated the effects of air annealing on the photoelectric performance of aluminum-
doped zinc oxide (AZO)/Al2O3/Ag/AZO. Transparent conductive films (TCFs) of AZO (55 …

[HTML][HTML] Influences of deposition conditions on atomic layer deposition films for enhanced performance in perovskite solar cells

B Yu, J Zhang, Y Yang, D Yu, Y Mai, X Chen - Energy Materials, 2024 - oaepublish.com
Atomic layer deposition (ALD) is a key technology for fabricating functional layers in
perovskite solar cells, as it can deposit pinhole-free films with atomic-level thickness and …

Tunable Encapsulation and Doping of Monolayer MoS2 by In Situ Probing of Excitonic Properties During Atomic Layer Deposition

A Henning, S Levashov, C Qian… - Advanced Materials …, 2023 - Wiley Online Library
Here, it is shown that in situ spectroscopic ellipsometry (SE) is a powerful method for probing
the effects of reactant adsorption and film formation on the excitonic properties of 2D …

Improving the electrical performance of monolayer top-gated MoS2 transistors by post bis (trifluoromethane) sulfonamide treatment

G Lin, MQ Zhao, M Jia, P Cui, H Zhao… - Journal of Physics D …, 2020 - iopscience.iop.org
Due to the large surface to volume ratio of two-dimensional (2D) materials, the electrical
performance of MoS 2 is very sensitive to extrinsic ambient conditions. Post treatments are …

[图书][B] Titanium dioxide: functional electronic materials for IoT devices

J Zhang - 2022 - search.proquest.com
The era of the Internet of Things (IoT) calls for advancements in device level to fulfill the
diversified applications. Titanium dioxide (TiO 2), belongs to the family of metal oxides, has …