Voltage waveform tailoring in radio frequency plasmas for surface charge neutralization inside etch trenches
The etching of sub micrometer high-aspect-ratio (HAR) features into dielectric materials in
low pressure radio frequency technological plasmas is limited by the accumulation of …
low pressure radio frequency technological plasmas is limited by the accumulation of …
Best impedance matching seeking of single-frequency capacitively coupled plasmas by numerical simulations
Impedance matching can maximize the absorbed power transferred to the plasma load and
minimize the reflected power, making it critical and indispensable for capacitively coupled …
minimize the reflected power, making it critical and indispensable for capacitively coupled …
2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
Control of electron dynamics, radical and metastable species generation in atmospheric pressure RF plasma jets by Voltage Waveform Tailoring
Atmospheric pressure capacitively coupled radio frequency discharges operated in He/N 2
mixtures and driven by tailored voltage waveforms are investigated experimentally using a …
mixtures and driven by tailored voltage waveforms are investigated experimentally using a …
[HTML][HTML] Power matching to pulsed inductively coupled plasmas
Matching of power delivery to nonlinear loads in plasma processing is a continuing
challenge. Plasma reactors used in microelectronics fabrication are increasingly multi …
challenge. Plasma reactors used in microelectronics fabrication are increasingly multi …
Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code
D Eremin, E Kemaneci, M Matsukuma… - Plasma Sources …, 2023 - iopscience.iop.org
Phenomena taking place in capacitively coupled plasmas with large electrodes and driven
at very high frequencies are studied numerically utilizing a novel energy-and charge …
at very high frequencies are studied numerically utilizing a novel energy-and charge …
The effects of match circuit on the breakdown process of capacitively coupled plasma driven by radio frequency
The breakdown process of capacitively coupled plasma (CCP) in the presence of a
matching network is rarely studied, even though it is the indispensable part of the most …
matching network is rarely studied, even though it is the indispensable part of the most …
Foundations of plasmas as ion sources
An overview of low temperature, partially magnetized ion sources is presented. This class of
devices is broadly characterized by plasma densities below 10 19 m− 3, electron …
devices is broadly characterized by plasma densities below 10 19 m− 3, electron …
Numerical impedance matching via extremum seeking control of single-frequency capacitively coupled plasmas
Impedance matching is a critical component of semiconductor plasma processing for
minimizing the reflected power and maximizing the plasma absorption power. In this work, a …
minimizing the reflected power and maximizing the plasma absorption power. In this work, a …
Control of ion flux-energy distributions by low frequency square-shaped tailored voltage waveforms in capacitively coupled plasmas
P Hartmann, I Korolov, J Escandón-López… - Plasma Sources …, 2022 - iopscience.iop.org
Capacitively coupled plasmas are routinely used in an increasing number of technological
applications, where a precise control of the quantity and the shape of the energy distribution …
applications, where a precise control of the quantity and the shape of the energy distribution …