Despite technical efforts and upgrades, advances in complementary metal–oxide– semiconductor circuits have become unsustainable in the face of inherent silicon limits. New …
The development of next-generation electronics requires scaling of channel material thickness down to the two-dimensional limit while maintaining ultralow contact resistance …
Y Xu, T Liu, K Liu, Y Zhao, L Liu, P Li, A Nie, L Liu… - Nature Materials, 2023 - nature.com
Abstract Two-dimensional (2D) semiconductors are promising channel materials for next- generation field-effect transistors (FETs). However, it remains challenging to integrate …
Abstract The International Roadmap for Devices and Systems (IRDS) forecasts that, for silicon-based metal–oxide–semiconductor (MOS) field-effect transistors (FETs), the scaling …
Two-dimensional transition-metal dichalcogenides (TMDs) are of interest for beyond-silicon electronics,. It has been suggested that bilayer TMDs, which combine good electrostatic …
A grand family of two-dimensional (2D) materials and their heterostructures have been discovered through the extensive experimental and theoretical efforts of chemists, material …
Field-effect transistors based on two-dimensional (2D) materials have the potential to be used in very large-scale integration (VLSI) technology, but whether they can be used at the …
The scaling of silicon metal–oxide–semiconductor field-effect transistors has followed Moore's law for decades, but the physical thinning of silicon at sub-ten-nanometre …
The metal–oxide–semiconductor field-effect transistor (MOSFET), a core element of complementary metal–oxide–semiconductor (CMOS) technology, represents one of the …