Recently, a new spotlight has been focused on block copolymers, thoroughly studied for
nearly half a century, because of their potential use in numerous nanotechnologies. This …

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

This Perspective addresses the current state of block copolymer lithography and identifies
key challenges and opportunities within the field. Significant strides in experimental and …

Block copolymers have received considerable attention as a promising platform for the
synthesis of nanomaterials and fabrication of nanostructures because of their self …

Bit-patterned media (BPM) for magnetic recording provides a route to thermally stable data
recording at> 1 Tb/in 2 and circumvents many of the challenges associated with extending …

Over the past 30 years, atomic force microscopy (AFM) has played an important role in
elucidating the structure and properties of polymer surfaces. AFM-based techniques have …

Templated self-assembly of a cylinder-forming poly (styrene-b-dimethylsiloxane)(PS−
PDMS) diblock copolymer has been investigated for nanolithography applications. The large …

We are inspired by the beauty and simplicity of self-organizing materials and the promise
they hold for enabling continued improvements in semiconductor technology. Self assembly …

Block copolymer thin films can be used as soft templates for a wide range of surfaces where
large area patterns of nanoscale features are desired. The cylindrical domains of acid …

This paper provides an overview of directed self-assembly (DSA) options that exhibit
potential for enabling extensible high-volume patterning of nanoelectronics devices. It …