III–N–V semiconductors for solar photovoltaic applications

JF Geisz, DJ Friedman - Semiconductor Science and Technology, 2002 - iopscience.iop.org
Abstract III–N–V semiconductors are promising materials for use in next-generation
multijunction solar cells because these materials can be lattice matched to substrates such …

Incorporation of nitrogen in nitride-arsenides: Origin of improved luminescence efficiency after anneal

SG Spruytte, CW Coldren, JS Harris… - Journal of Applied …, 2001 - pubs.aip.org
A key to the utilization of nitride-arsenides for long wavelength optoelectronic devices is
obtaining low defect materials with long nonradiative lifetimes. Currently, these materials …

[PDF][PDF] High-efficiency III-V multijunction solar cells

JM Olson, DJ Friedman, S Kurtz - Handbook of Photovoltaic Science …, 2003 - academia.edu
The large-scale use of photovoltaics is slowly becoming a reality. Small scale (∼ 10–20 kW)
power systems using Si solar cells now compete with fossil-fueled electric generators for …

Metastable cubic zinc-blende III/V semiconductors: growth and structural characteristics

A Beyer, W Stolz, K Volz - Progress in Crystal Growth and Characterization …, 2015 - Elsevier
III/V semiconductors with cubic zinc-blende crystal structure, for example GaAs, GaP or InP,
become metastable if atoms with significantly smaller or larger covalent radius than the …

Influence of Sb, Bi, Tl, and B on the incorporation of N in GaAs

F Dimroth, A Howard, JK Shurtleff… - Journal of applied …, 2002 - pubs.aip.org
GaAs: N is an interesting material for many devices due to its unique compositional variation
of band gap. Small amounts of N lead to a strong decrease in band gap energy as well as …

Growth and characterisation of Ga (NAsBi) alloy by metal–organic vapour phase epitaxy

ZL Bushell, P Ludewig, N Knaub, Z Batool, K Hild… - Journal of crystal …, 2014 - Elsevier
This paper summarises results of the epitaxial growth of Ga (NAsBi) by metal–organic
vapour phase epitaxy (MOVPE) and the subsequent optical and structural characterisations …

Low threshold 1.2 μm InGaAs quantum well lasers grown under low As/III ratio

T Takeuchi, YL Chang, A Tandon, D Bour… - Applied physics …, 2002 - pubs.aip.org
We have achieved 160 A/cm 2 threshold current density of a 1.21 μm InGaAs/GaAs quantum
well (QW) laser grown under a very low As/III ratio. We investigated the As/III ratio …

Development and current status of organometallic vapor phase epitaxy

GB Stringfellow - Journal of crystal growth, 2004 - Elsevier
The first success with the growth of III/V semiconductor materials by OMVPE dates back to
the mid-1950s. Today, it is the largest volume technique for the production of III/V photonic …

Evaluation of NF3 versus dimethylhydrazine as N sources for GaAsN

S Kurtz, R Reedy, B Keyes, GD Barber, JF Geisz… - Journal of crystal …, 2002 - Elsevier
Two nitrogen precursors (NF3 and u-dimethylhydrazine) and two gallium precursors
(trimethylgallium and triethylgallium) are explored for the growth of GaAs1− xNx by metal …

Inverted lattice-matched GaInP/GaAs/GaInNAsSb triple-junction solar cells: Epitaxial lift-off thin-film devices and potential space applications

N Miyashita, Y Okada - Photovoltaics for Space, 2023 - Elsevier
High-efficiency, radiation-tolerant solar cell technology is essential for numerous space
applications. To discover new approaches to such potential solutions to the challenges of …