Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …

Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …

Unlike α-and γ-mode operation, electrons accelerated by strong drift and ambipolar electric
fields in the plasma bulk and at the sheath edges are found to dominate the ionization in …

Self-organized spatial structures in the light emission from the ion-ion capacitive rf plasma of
a strongly electronegative gas (CF 4) are observed experimentally for the first time. Their …

The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …

The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

Using particle-in-cell simulations, we predict that it is possible to obtain a significant
difference between the ion flux to the powered electrode and that to the grounded electrode …

By applying the asymmetric magnetic field to a discharge, the dc self-bias and asymmetric
plasma response can be generated even in a geometrically and electrically symmetric …

Low-pressure RF plasma in fluorohydrocarbon gas mixtures is widely used in modern
microelectronics, eg in the etching of materials with a low dielectric constant (low-k) …

Abstract Low-pressure (< 10 s mTorr) multi-frequency capacitively coupled plasmas (CCPs)
are essential for critical plasma processing applications such as high aspect ratio dielectric …