Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Recent advances in ultraviolet nanophotonics: from plasmonics and metamaterials to metasurfaces
Nanophotonic devices, composed of metals, dielectrics, or semiconductors, enable precise
and high-spatial-resolution manipulation of electromagnetic waves by leveraging diverse …
and high-spatial-resolution manipulation of electromagnetic waves by leveraging diverse …
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
Optimization of extreme ultra-violet light emitted from the CO2 laser-irradiated tin plasmas using 2D radiation hydrodynamic simulations
We studied Extreme Ultra-Violet (EUV) emission characteristics of the 13.5 nm wavelength
from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …
from CO_2 laser-irradiated pre-formed tin plasmas using 2D radiation hydrodynamic …
[HTML][HTML] The development of laser-produced plasma EUV light source
DK Yang, D Wang, QS Huang, Y Song, J Wu, WX Li… - Chip, 2022 - Elsevier
Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial
requirements of new-generation semiconductor fabrication. The development of high-power …
requirements of new-generation semiconductor fabrication. The development of high-power …
High-energy ions from Nd: YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model
DJ Hemminga, L Poirier, MM Basko… - Plasma Sources …, 2021 - iopscience.iop.org
We present the results of a joint experimental and theoretical study of plasma expansion
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
EUV spectroscopy of highly charged ions in an electron-beam ion trap
Extreme-ultraviolet (EUV) spectra of Sn 13+− Sn 15+ ions have been measured in an
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …