Extraction of packaged GaN power transistors parasitics using S-parameters

L Pace, N Defrance, A Videt, N Idir… - … on Electron Devices, 2019 - ieeexplore.ieee.org
In order to better predict the high-frequency switching operation of transistors in power
converters, parasitic elements of these devices such as resistances, inductances, and …

Analytical model for Schottky barrier height and threshold voltage of AlGaN/GaN HEMTs with piezoelectric effect

WE Muhea, FM Yigletu… - IEEE Transactions on …, 2018 - ieeexplore.ieee.org
Physics-based models for calculating the threshold voltage (V th) of GaN-based high
electron mobility transistor (HEMT) is proposed. Assuming that the 2-D electron gas in III-V …

Enhancement in analog/RF and power performance of underlapped dual-gate GaN-based MOSHEMTs with quaternary InAlGaN barrier of varying widths

H Mukherjee, M Kar, A Kundu - Journal of Electronic Materials, 2022 - Springer
An underlapped dual-gate (U-DG) quaternary In 0.05 Al 0.75 Ga 0.2 N/GaN metal–oxide–
semiconductor high-electron-mobility transistor (MOS-HEMT) and a conventional ternary Al …

AlN/GaN MOS-HEMTs Technology

S Taking - 2012 - theses.gla.ac.uk
The ever increasing demand for higher power devices at higher frequencies has prompted
much research recently into the aluminium nitride/gallium nitride high electron mobility …

[HTML][HTML] Development and Characterization of an Advanced Voltage-Controllable Capacitor Based on AlInGaN/GaN-Si (111) Epitaxy

H Guan, G Shen - Coatings, 2024 - mdpi.com
The AlInGaN/GaN heterojunction epitaxy material with high cutoff frequency and saturated
power density has become a very popular candidate for millimeter wave applications in next …

S-parameter characterization of gan hemt power transistors for high frequency modeling

L Pace, N Defrance, A Videt, N Idir… - PCIM Europe 2018; …, 2018 - ieeexplore.ieee.org
Gallium Nitride (GaN) power devices that have been developed these recent years are ideal
candidates for high frequency power conversion, leading to a reduction of size and weight of …

Fabrication and Characterization of a Novel Varistor Based on AlInGaN/GaN Heterojunction Epitaxy on High Resistance Silicon (111) Substrates

H Guan, L He, J Wu, Z Zeng, Y Li… - … on Electron Devices, 2022 - ieeexplore.ieee.org
A high-resistance Si-based AlInGaN/GaN heterojunction epitaxy specifying AlN/AlGaN
laminated buffer layers and AlInGaN barrier layer with 45% Al composition was successfully …

Impact of structural modification by spacer layer inclusion on AlGaN/GaN HEMT performance

MM Hossain, MM Hassan… - … on Information and …, 2021 - ieeexplore.ieee.org
In this paper, Performances are analyzed of an AlGaN/GaN-based High Electron Mobility
Transistor for different device structures. As the 2DEG well forms in the interface of two …

435mS/mm transconductance for AlGaN/GaN HEMTs on HR-Si substrate with optimised gate-source spacing

S Bouzid, H Maher, N Defrance, V Hoel, F Lecourt… - Electronics letters, 2012 - IET
A report is presented on high transconductance Gm measured on AlGaN/GaN HEMTs with a
12.5 nm-thick AlGaN barrier layer, grown on high resistivity silicon substrate using the …

Improvement of transconductance and gate source capacitance of Al0.27Ga0.73N/GaN HEMT at 45nm gate length with In0.1Ga0.9N back-barrier

SP Nayak, P Dutta… - 2017 Devices for Integrated …, 2017 - ieeexplore.ieee.org
An Al 0.27 Ga 0.73 N/GaN HEMT is developed at LG= 100nm gate length with In 0.1 Ga 0.9
N back-barrier. The physical insight of In 0.1 Ga 0.9 N as back-barrier and the impact of its …