Independent control of dual rf monopolar electrosurgery with shared return electrode
DW Heckel, DL Tonn - US Patent App. 17/318,055, 2021 - Google Patents
An electrosurgical generator includes a first radio frequency source having a first power
supply configured to output a first direct current waveform; a first radio frequency inverter …
supply configured to output a first direct current waveform; a first radio frequency inverter …
Method of controlling uniformity of plasma and plasma processing system
DH Na, SB Shim, HD Jin, MY Hur, KH Kim… - US Patent …, 2022 - Google Patents
According to a method of controlling uniformity of plasma, a first RF driving pulse signal
including first RF pulses is generated by pulsing a first RF signal having a first fre quency …
including first RF pulses is generated by pulsing a first RF signal having a first fre quency …
Independent control of dual rf electrosurgery
DW Heckel, DL Tonn - US Patent App. 17/318,612, 2021 - Google Patents
An electrosurgical generator includes a first radio frequency source having: a first power
supply configured to output a first direct current waveform; a first radio frequency inverter …
supply configured to output a first direct current waveform; a first radio frequency inverter …