Evaluation of finite difference and FFT-based solutions of the transport of intensity equation
A finite difference method is proposed for solving the transport of intensity equation.
Simulation results show that although slower than fast Fourier transform (FFT)-based …
Simulation results show that although slower than fast Fourier transform (FFT)-based …
Absorber topography dependence of phase edge effects
A Shanker, M Sczyrba, B Connolly… - Photomask …, 2015 - spiedigitallibrary.org
Mask topography contributes to phase at the wafer plane, even for OMOG binary masks
currently in use at the 22nm node in deep UV (193nm) lithography. Here, numerical …
currently in use at the 22nm node in deep UV (193nm) lithography. Here, numerical …
The calculation and representation of polarization aberration induced by 3D mask in lithography simulation
Y Hao, Y Li, T Li, N Sheng - AOPC 2017: Optoelectronics and …, 2017 - spiedigitallibrary.org
With the continuous shrink of feature sizes, the 3D mask effects cannot be ignored in
computational lithography. 3D mask effects inducing focus shift and scalar aberration like …
computational lithography. 3D mask effects inducing focus shift and scalar aberration like …
A Recursive Phase Retrieval Technique Using Transport of Intensity: Reconstruction of Imaged Phase and 3D Surfaces
M Basunia - 2016 - rave.ohiolink.edu
Transport of intensity is a noninterferometric method to find the phase of an object by
recording optical intensities at different distances of propagation. The transport of intensity …
recording optical intensities at different distances of propagation. The transport of intensity …
[图书][B] Differential methods for phase imaging in optical lithography
A Shanker - 2018 - search.proquest.com
Differential methods are shown to reveal inherent phase in light, corresponding to either the
structure of the scattering object, or to aberrations in the imaging medium. Intensity …
structure of the scattering object, or to aberrations in the imaging medium. Intensity …