2022 review of data-driven plasma science
Data-driven science and technology offer transformative tools and methods to science. This
review article highlights the latest development and progress in the interdisciplinary field of …
review article highlights the latest development and progress in the interdisciplinary field of …
Plasma information-based virtual metrology (PI-VM) and mass production process control
In this paper, we review the development of plasma engineering technology that improves
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
In the semiconductor etch process, as the critical dimension (CD) decreases and the
difficulty of the process control increases, in-situ and real-time etch profile monitoring …
difficulty of the process control increases, in-situ and real-time etch profile monitoring …
[HTML][HTML] Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production
Meter-scale of the large area inductively coupled plasma etchers with the capacitive power
coupling are widely applied for the mass production of OLED (organic light emitting diode) …
coupling are widely applied for the mass production of OLED (organic light emitting diode) …
Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features
Due to increasing demand on the fabrication yield and throughput in micro/nanoscale
manufacturing, virtual metrology (VM) has emerged as an effective data-based approach for …
manufacturing, virtual metrology (VM) has emerged as an effective data-based approach for …
Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM
Metal target dry etching process applied for the organic light emitting diode display
manufacturing is hard to control without the generation of the defect particles. A large …
manufacturing is hard to control without the generation of the defect particles. A large …
Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma
Ion-induced etch damage on trench surfaces of Ge 2 Sb 2 Te 5 (GST) by reactive ion etching
(RIE) is investigated with Ar/SF 6 capacitively coupled plasma (CCP). Etch damage on the …
(RIE) is investigated with Ar/SF 6 capacitively coupled plasma (CCP). Etch damage on the …
Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM
The production efficiencies of organic light emitting diode (OLED) displays and
semiconductor manufacturing have been dramatically improving with the help of plasma …
semiconductor manufacturing have been dramatically improving with the help of plasma …
Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing
S Park, Y Kyung, J Lee, Y Jang, T Cha… - Plasma Processes …, 2019 - Wiley Online Library
High‐aspect ratio contact (HARC) etching is a bottleneck step of the high‐definition organic
light emitting diode (OLED) display manufacturing processes. HARC process is frequently …
light emitting diode (OLED) display manufacturing processes. HARC process is frequently …
In situ monitoring of plasma ignition step in capacitively coupled plasma systems
Y Lee, W Song, SJ Hong - Japanese Journal of Applied Physics, 2020 - iopscience.iop.org
For pulsed plasma to be used in an atomic layer process, the plasma ignition step should be
carefully controlled to avoid lagged plasma ignition. We observed the ignition trend of Ar …
carefully controlled to avoid lagged plasma ignition. We observed the ignition trend of Ar …