Exploring machine learning for semiconductor process optimization: a systematic review

YL Chen, S Sacchi, B Dey, V Blanco… - IEEE Transactions …, 2024 - ieeexplore.ieee.org
As machine learning (ML) continues to find applications, extensive research is currently
underway across various domains. This study examines the current methodologies of ML …

LithoPW: Leveraging Visual Memory Encoding and Defect-Aware Optimization for Precise Determination of the Lithography Process Windows

J Shen, S Lyu, Y Lu - … Transactions on Circuits and Systems for …, 2024 - ieeexplore.ieee.org
Lithography stands as a critical step in the manufacturing of integrated circuits, where the
precise control of focus and exposure dose parameters is vital for optimal results. The …

Trends in e-beam metrology and inspection

GF Lorusso - Metrology, Inspection, and Process Control …, 2024 - spiedigitallibrary.org
For many years, e-beam SEM metrology has been quite conservative. However, a few years
ago, we began to observe a sort of restlessness in the field, a trend that was consistently …

[PDF][PDF] Exploring Machine Learning for Semiconductor Process Optimization: A Systematic Review

P Leray, S De Gendt - 2024 - researchgate.net
As machine learning continues to find applications, extensive research is currently
underway across various domains. This study examines the current methodologies of …

An Efficient Transformer-Based Approach for DUV Lithography SEM Image Denoising

J Shen, B Zhao, H Lu, P Lou, W Zhou… - 2023 International …, 2023 - ieeexplore.ieee.org
Traditional Scanning Electron Microscopy (SEM) image noise reduction techniques, such as
frame averaging or utilizing higher resolution SEM images, may result in potential electron …

An Innovative Lithography Process Window Decision Based On Aggregation of Multi Machine Learning Approaches

K Zhou, W Zhou, X Zhao, J Shen… - 2023 International …, 2023 - ieeexplore.ieee.org
Automated image analysis and image classification system that based on machine learning
have been developed and applied to the PWQ/FEM flow to enhance process stability and …

Silicon process characterization based on massive SEM contour extraction and hotspot pattern decomposition

K Zhou, W Zhou, Y Meng, X Zhao, L Xu… - Eighth International …, 2024 - spiedigitallibrary.org
As the production scale of HVM expands, the daily generation of measurement images and
defect images increases significantly. Identifying the root causes of such a vast number of …