Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

Material science and device physics in SiC technology for high-voltage power devices

T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …

Mechanisms of growth and defect properties of epitaxial SiC

F La Via, M Camarda, A La Magna - Applied Physics Reviews, 2014 - pubs.aip.org
In the last ten years, large improvements in the epitaxial silicon carbide processes have
been made. The introduction of chloride precursors, the epitaxial growth on large area …

Formation of extended defects in 4H‐SiC epitaxial growth and development of a fast growth technique

H Tsuchida, M Ito, I Kamata… - physica status solidi (b …, 2009 - Wiley Online Library
This paper surveys extended defects in 4H‐SiC epilayers and reports recent results
concerning fast epitaxial growth. Synchrotron X‐ray topography, transmission electron …

Recent advances in 4H-SiC epitaxy for high-voltage power devices

H Tsuchida, I Kamata, T Miyazawa, M Ito… - Materials Science in …, 2018 - Elsevier
This paper reports recent advances in high-quality 4H-SiC epitaxial growth. The modern 4H-
SiC epitaxial reactors, techniques to improve growth rates and large-diameter uniformity and …

Basal plane dislocation reduction in 4H-SiC epitaxy by growth interruptions

RE Stahlbush, BL VanMil, RL Myers-Ward… - Applied Physics …, 2009 - pubs.aip.org
The paths of basal plane dislocations (BPDs) through 4 H-SiC epitaxial layers grown on
wafers with an 8 offcut were tracked using ultraviolet photoluminescence imaging. The …

MD simulation study on defect evolution and doping efficiency of p-type doping of 3C-SiC by Al ion implantation with subsequent annealing

J Wu, Z Xu, L Liu, A Hartmaier, M Rommel… - Journal of Materials …, 2021 - pubs.rsc.org
We use molecular dynamics (MD) simulation with numerical characterisation and statistical
analysis to study the mechanisms of damage evolution and p-type doping efficiency by …

Annealing induced extended defects in as-grown and ion-implanted 4H–SiC epitaxial layers

M Nagano, H Tsuchida, T Suzuki… - Journal of applied …, 2010 - pubs.aip.org
The formation of extended defects in the 4H–SiC epilayer induced by the implantation/
annealing process was investigated using synchrotron reflection x-ray topography, KOH …

Contrast analysis of Shockley partial dislocations in 4H-SiC observed by synchrotron Berg–Barrett X-ray topography

H Matsuhata, H Yamaguchi, T Yamashita… - Philosophical …, 2014 - Taylor & Francis
Shockley partial dislocations in 4H-SiC were observed using monochromatic synchrotron X-
ray topography with a grazing-incidence Bragg-case geometry, that is, Berg–Barrett …

Nucleation mechanism of dislocation half-loop arrays in 4H-silicon carbide homoepitaxial layers

N Zhang, Y Chen, Y Zhang, M Dudley… - Applied Physics …, 2009 - pubs.aip.org
A model is presented for the formation mechanism of dislocation half-loop arrays formed
during the homoepitaxial growth of 4 H-SiC⁠. The reorientation during glide of originally …