Precursor design and reaction mechanisms for the atomic layer deposition of metal films

KB Ramos, MJ Saly, YJ Chabal - Coordination chemistry reviews, 2013 - Elsevier
Deposition of thin films with desired compositions, conformality and bonding to substrates is
a key component in nanotechnology research. The growth of metal films by atomic layer …

Cyclodextrin-cobalt (II) molecule-ion pairs as precursors to active Co3O4/ZrO2 catalysts for the complete oxidation of formaldehyde: Influence of the cobalt source

L Bai, F Wyrwalski, M Safariamin, R Bleta… - Journal of …, 2016 - Elsevier
The present paper reports on the use of β-cyclodextrin (β-CD) during the preparation of
zirconia-supported cobalt oxide catalysts by impregnation and their performances in the …

Effect of cobalt precursors on the dispersion, reduction, and CO oxidation of CoOx/γ-Al2O3 catalysts calcined in N2

L Zhang, L Dong, W Yu, L Liu, Y Deng, B Liu… - Journal of colloid and …, 2011 - Elsevier
The present work tentatively investigated the effect of cobalt precursors (cobalt acetate and
cobalt nitrate) on the physicochemical properties of CoOx/γ-Al2O3 catalysts calcined in N2 …

The effect of the absence of Ni, Co, and Ni–Co catalyst pretreatment on catalytic activity for hydrogen production via oxidative steam reforming of ethanol

M Muñoz, S Moreno, R Molina - International journal of hydrogen energy, 2014 - Elsevier
This article presents a study of the catalytic performance of Ni, Co, and Ni–Co–Mg–Al mixed
oxides obtained from hydrotalcite precursors for the oxidative steam reforming of ethanol …

Phase-controlled growth of cobalt oxide thin films by atomic layer deposition

S Jung, DK Nandi, S Yeo, H Kim, Y Jang, JS Bae… - Surface and Coatings …, 2018 - Elsevier
Cobalt oxide (CoO x) thin films were deposited on thermally grown SiO 2 substrates by
atomic layer deposition (ALD) using bis (1, 4-di-iso-propyl-1, 4-diazabutadiene) cobalt (C 16 …

Low-temperature atomic layer deposition of cobalt oxide thin films using dicobalt hexacarbonyl tert-butylacetylene and ozone

B Han, KH Choi, K Park, WS Han… - … and Solid-State Letters, 2011 - iopscience.iop.org
We report the deposition of cobalt oxide thin films at 68 C–138 C using alternating injections
of dicobalt hexacabonyl tert-butylacetylene (CCTBA) and ozone. The films consisted of Co 3 …

Atomic layer deposition of cobalt oxide thin films using cyclopentadienylcobalt dicarbonyl and ozone at low temperatures

B Han, K Ha Choi, J Min Park, J Woo Park… - Journal of Vacuum …, 2013 - pubs.aip.org
The authors report the atomic layer deposition (ALD) of cobalt oxide thin films at 50–150 C
using alternating exposures to cyclopentadienylcobalt dicarbony [CpCo (CO) 2] and ozone …

Atomic layer deposition of stoichiometric Co3O4 films using bis (1, 4-di-iso-propyl-1, 4-diazabutadiene) cobalt

B Han, JM Park, KH Choi, WK Lim, TR Mayangsari… - Thin Solid Films, 2015 - Elsevier
We report the deposition of cobalt oxide films at 120–300° C using alternating injections of a
novel liquid cobalt precursor, bis (1, 4-di-iso-propyl-1, 4-diazabutadiene) cobalt [C 16 H 32 …

Monolayer dispersion of CoO on Al2O3 probed by positronium atom

ZW Liu, HJ Zhang, ZQ Chen - Applied surface science, 2014 - Elsevier
CoO/Al 2 O 3 catalysts were prepared by wet impregnation method with CoO contents
ranging from 0 wt% to 24 wt%. X-ray diffraction and X-ray photoelectron spectroscopy …

利用氧化錳觸媒去除氣流中臭氧, 一氧化碳與異丙醇之研究

劉昱翬, 張宗良 - 2004 - ir.lib.nycu.edu.tw
不同的鍛燒溫度可以製備出不同氧化態的氧化錳, 但由於其製備方式的差異,
而具有不同的氧化態晶型或比表面積. 本研究利用兩種不同程序製造之錳觸媒 …