Challenges in material processing and reliability issues in AlGaN/GaN HEMTs on silicon wafers for future RF power electronics & switching applications: A critical …

J Ajayan, D Nirmal, P Mohankumar, B Mounika… - Materials Science in …, 2022 - Elsevier
In order to handle high power with good thermal stability at RF & microwave frequencies
wider bandgap semiconductor based transistors are highly desirable and GaN & AlGaN …

Polarity in GaN and ZnO: Theory, measurement, growth, and devices

J Zuniga-Perez, V Consonni, L Lymperakis… - Applied Physics …, 2016 - pubs.aip.org
The polar nature of the wurtzite crystalline structure of GaN and ZnO results in the existence
of a spontaneous electric polarization within these materials and their associated alloys (Ga …

A brief overview of the rapid progress and proposed improvements in gallium nitride epitaxy and process for third-generation semiconductors with wide bandgap

AC Liu, YY Lai, HC Chen, AP Chiu, HC Kuo - Micromachines, 2023 - mdpi.com
In this paper, we will discuss the rapid progress of third-generation semiconductors with
wide bandgap, with a special focus on the gallium nitride (GaN) on silicon (Si). This …

High-performance InAlN/GaN HEMTs on silicon substrate with high fT× Lg

P Cui, A Mercante, G Lin, J Zhang, P Yao… - Applied Physics …, 2019 - iopscience.iop.org
We report an 80 nm gate-length In 0.17 Al 0.83 N/GaN high-electron mobility transistor
(HEMT) on silicon substrate with a record low gate leakage current of 7.12× 10− 7 A mm− 1 …

94-GHz large-signal operation of AlInN/GaN high-electron-mobility transistors on silicon with regrown ohmic contacts

D Marti, S Tirelli, V Teppati, L Lugani… - IEEE Electron device …, 2014 - ieeexplore.ieee.org
We report the first 94-GHz (W-band) large-signal performance of AlInN/GaN high-electron-
mobility transistors (HEMTs) grown on high-resistivity silicon (111) substrates. A maximum …

InAlN/GaN HEMT on Si with fmax= 270 GHz

P Cui, M Jia, H Chen, G Lin, J Zhang… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Device surface properties are critical for its performance such as channel electron density,
leakage current, subthreshold swing (SS), and noise in gallium nitride high-electron-mobility …

Power performance at 40 GHz of AlGaN/GaN high-electron mobility transistors grown by molecular beam epitaxy on Si (111) substrate

P Altuntas, F Lecourt, A Cutivet… - IEEE Electron …, 2015 - ieeexplore.ieee.org
This letter reports on the demonstration of microwave power performance at 40 GHz on
AlGaN/GaN high-electron mobility transistor grown on silicon (111) substrate by molecular …

Dual gate AlGaN/GaN MOS-HEMT biosensor for electrical detection of biomolecules-analytical model

R Mann, S Rewari, S Sharma… - … Science and Technology, 2023 - iopscience.iop.org
This paper proposes an analytical model for a dual gate AlGaN/GaN Metal oxide
semiconductor-high-electron-mobility transistor (MOS-HEMT) biosensor for electrical …

Improved DC and RF Performance of Novel MIS p-GaN-Gated HEMTs by Gate-All-Around Structure

CJ Yu, CW Hsu, MC Wu, WC Hsu… - IEEE Electron …, 2020 - ieeexplore.ieee.org
In this study, we report a novel structure of enhancement-mode metal-insulator-
semiconductor high electron mobility transistor (E-mode MIS HEMT) with p-GaN gate by …

High- High Johnson's Figure-of-Merit 0.2- Gate AlGaN/GaN HEMTs on Silicon Substrate With Passivation

S Huang, K Wei, G Liu, Y Zheng… - IEEE electron device …, 2014 - ieeexplore.ieee.org
This letter reports a 0.2-μ\rmm gate AlGaN/GaN high-electron-mobility transistors (HEMTs)
on an Si substrate passivated with an \rmAlN/\rmSiN_\rmx (4/20 nm) stack layer. The 4-nm …