This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

“Nanofabrication” is the process of making functional structures with arbitrary patterns
having minimum dimensions currently defined (more-or-less arbitrarily) to be e100 nm …

Nanoimprint lithography (NIL) is a high throughput, high-resolution parallel patterning
method in which a surface pattern of a stamp is replicated into a material by mechanical …

Nanoimprint is an emerging lithographic technology that promises high-throughput
patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint …

▪ Abstract Nanostructures are fabricated using either conventional or unconventional tools—
that is, by techniques that are highly developed and widely used or by techniques that are …

This review provides a survey of lithography techniques and the resist materials employed
with these techniques. The first part focuses on the conventional lithography methods used …

An efficient method has been successfully realized for the controlled synthesis of various
metal/carbon nanoarchitectures. The formation of metal/carbon nanocables and nanochains …

Adaptive programmable materials have attracted increasing attention due to their high
functionality, autonomous behavior, encapsulation, and site-specific confinement …

Microelectromechanical systems (MEMS) are evolving into highly integrated technologies
for a variety of application areas. Add the biological dimension to the mix and a host of new …