Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

The metal-supported solid oxide fuel cell (MS-SOFC) is of current research interest in the
clean energy field due to its high performance, quick start-up, thermal cycle stability, and …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific
compositions with precise structures and controlled interfaces. This will enable the …

Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide
thin films with nanoscale thickness control. Most successful industrial applications have …

Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics,
but it is also recognized as a promising fabrication strategy for various alkali-metal-based …

Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

The last 20 years have seen a massive increase in reports on complex oxides with
functional properties synthesized by atomic layer deposition (ALD). Many of these …

Atomic layer deposition (ALD) has recently attracted attention as a technique to synthesize
and engineer high-performance catalysts and electrodes for fuel cells. Unique advantages …

Magnesium‐substituted CuCrO2 delafossite is a promising candidate for p‐type transparent
conducting oxide applications owing to its relatively high electrical conductivity and optical …