Effect of power on crystallinity and opto-electronic properties of silicon thin films grown using VHF PECVD process
S Juneja, S Kumar - Silicon, 2021 - Springer
The silicon thin films have been deposited using VHF (60 MHz) plasma enhanced chemical
vapor deposition (PECVD) process. The influence of the power (10–50 W), used during the …
vapor deposition (PECVD) process. The influence of the power (10–50 W), used during the …
[PDF][PDF] Surface functionalization of silicon nanocrystals via a microwave reactor
D Beri - 2021 - scholar.archive.org
Silicon nanocrystals (SiNCs) have attracted great interest in recent decades due to their
diverse (potential) applications in research and industry. For example, SiNCs could be used …
diverse (potential) applications in research and industry. For example, SiNCs could be used …