Seeing is believing: atomic force microscopy imaging for nanomaterial research

J Zhong, J Yan - Rsc Advances, 2016 - pubs.rsc.org
The research and development of nanotechnology has led to materials science and
engineering entering the “nanomaterial era”. It is pivotal for analyzing the physicochemical …

Dopant, composition and carrier profiling for 3D structures

W Vandervorst, C Fleischmann, J Bogdanowicz… - Materials Science in …, 2017 - Elsevier
With the transition from planar to three-dimensional device architectures, devices such as
FinFETs, TFETs and nanowires etc. become omnipresent. This requires the dopant atom …

Analysis of trap-assisted tunneling in vertical Si homo-junction and SiGe hetero-junction tunnel-FETs

A Vandooren, D Leonelli, R Rooyackers, A Hikavyy… - Solid-State …, 2013 - Elsevier
This paper reports on the integration of vertical nTunnel FETs (TFETs) with SiGe hetero-
junction and analyzes the presence of trap-assisted tunneling impacting the device …

Nanoscale electrical degradation of silicon–carbon composite anode materials for lithium-ion batteries

SH Kim, YS Kim, WJ Baek, S Heo, DJ Yun… - … applied materials & …, 2018 - ACS Publications
High-performance lithium-ion batteries (LIBs) are in increasing demand for a variety of
applications in rapidly growing energy-related fields including electric vehicles. To develop …

[图书][B] Metrology and Diagnostic Techniques for Nanoelectronics

Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

Impact of process and geometrical parameters on the electrical characteristics of vertical nanowire silicon n-TFETs

A Vandooren, D Leonelli, R Rooyackers, K Arstila… - Solid-State …, 2012 - Elsevier
We report on the process integration of vertical silicon Tunnel FETs (TFETs) and analyze the
impact of process and geometrical parameters on the device behavior. The gate–source …

[HTML][HTML] 3D to 2D perspectives-Traditional and new doping and metrology challenges at the nanoscale

M Georgieva, N Petkov, R Duffy - Materials Science in Semiconductor …, 2023 - Elsevier
In this perspectives paper we will explore the doping state-of-the-art as it evolves for 3D to
2D structures and materials, and the following impact on the metrology methods needed to …

P–n junctions in planar GaAs nanowires

BR Borodin, PA Alekseev, V Khayrudinov… - …, 2023 - pubs.rsc.org
Control over the doping at the nanoscale during the growth of nanostructures is one of the
key challenges of device fabrication. In this work we study p (Zn)-and n (Sn)-doping …

Electrical tomography using atomic force microscopy and its application towards carbon nanotube-based interconnects

A Schulze, T Hantschel, A Dathe, P Eyben, X Ke… - …, 2012 - iopscience.iop.org
The fabrication and integration of low-resistance carbon nanotubes (CNTs) for interconnects
in future integrated circuits requires characterization techniques providing structural and …

Dopant/carrier profiling for 3D‐structures

W Vandervorst, A Schulze, AK Kambham… - … status solidi (c), 2014 - Wiley Online Library
With the transition from planar to three‐dimensional device architectures such as FinFets,
TFETs and nanowires, new metrology approaches are required to characterize the 3D …