A review on 3D printing: An additive manufacturing technology

A Jadhav, VS Jadhav - Materials Today: Proceedings, 2022 - Elsevier
Additive manufacturing, often known as 3D printing, is a type of digital fabrication technique
that builds physical items from a geometrical model through the addition of materials. The …

Advances in atomic layer deposition

J Zhang, Y Li, K Cao, R Chen - Nanomanufacturing and Metrology, 2022 - Springer
Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in
nanofabrication. Based on its self-limiting surface reactions, ALD has excellent conformality …

Area-selective deposition: fundamentals, applications, and future outlook

GN Parsons, RD Clark - Chemistry of Materials, 2020 - ACS Publications
This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

Understanding chemical and physical mechanisms in atomic layer deposition

NE Richey, C De Paula, SF Bent - The Journal of chemical physics, 2020 - pubs.aip.org
Atomic layer deposition (ALD) is a powerful tool for achieving atomic level control in the
deposition of thin films. However, several physical and chemical phenomena can occur …

Self-aligned patterning of tantalum oxide on Cu/SiO2 through redox-coupled inherently selective atomic layer deposition

Y Li, Z Qi, Y Lan, K Cao, Y Wen, J Zhang, E Gu… - Nature …, 2023 - nature.com
Atomic-scale precision alignment is a bottleneck in the fabrication of next-generation
nanoelectronics. In this study, a redox-coupled inherently selective atomic layer deposition …

Atomic layer deposition of conductive and semiconductive oxides

B Macco, WMM Kessels - Applied Physics Reviews, 2022 - pubs.aip.org
Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, doping …

Inherently selective atomic layer deposition and applications

K Cao, J Cai, R Chen - Chemistry of Materials, 2020 - ACS Publications
The chemical approaches enabling selective atomic layer deposition (ALD) are gaining
growing interest. The selective ALD has unlocked attractive avenues for the development of …

Area-Selective Atomic Layer Deposition of Al2O3 with a Methanesulfonic Acid Inhibitor

J Yarbrough, F Pieck, AB Shearer, P Maue… - Chemistry of …, 2023 - ACS Publications
Experiment and density functional theory (DFT) are combined to study the selective growth
of Al2O3 with methanesulfonic acid (MSA) as a small molecule inhibitor (SMI) for Cu. Two …

Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity

J Lee, JM Lee, H Oh, C Kim, J Kim… - Advanced Functional …, 2021 - Wiley Online Library
Area‐selective atomic layer deposition (AS‐ALD) offers tremendous advantages in
comparison with conventional top‐down patterning processes that atomic‐level selective …

Atomic level deposition to extend Moore's law and beyond

R Chen, YC Li, JM Cai, K Cao - International Journal of …, 2020 - iopscience.iop.org
In the past decades, Moore's law drives the semiconductor industry to continuously shrink
the critical size of transistors down to 7 nm. As transistors further downscaling to smaller …