A review of ultrawide bandgap materials: properties, synthesis and devices

M Xu, D Wang, K Fu, DH Mudiyanselage… - Oxford Open …, 2022 - academic.oup.com
Ultrawide bandgap (UWBG) materials such as diamond, Ga2O3, hexagonal boron nitride (h-
BN) and AlN, are a new class of semiconductors that possess a wide range of attractive …

Self-Induced Core–Shell InAlN Nanorods: Formation and Stability Unraveled by Ab Initio Simulations

M Alves Machado Filho, CL Hsiao… - ACS Nanoscience …, 2022 - ACS Publications
By addressing precursor prevalence and energetics using the DFT-based synthetic growth
concept (SGC), the formation mechanism of self-induced InAlN core–shell nanorods (NRs) …

Van der Waals stacks of few-layer h-AlN with graphene: an ab initio study of structural, interaction and electronic properties

RB Dos Santos, F de Brito Mota, R Rivelino… - …, 2016 - iopscience.iop.org
Graphite-like hexagonal AlN (h-AlN) multilayers have been experimentally manifested and
theoretically modeled. The development of any functional electronics applications of h-AlN …

Piezoelectric aluminum nitride thin films for CMOS compatible MEMS: Sputter deposition and doping

S Sandeep, RMR Pinto, J Rudresh… - Critical Reviews in …, 2024 - Taylor & Francis
Amongst the piezoelectric thin films suited for microelectromechanical systems (MEMS), AlN
has gained particular technological relevance due to its unique material properties (large …

AlN metal–semiconductor field-effect transistors using Si-ion implantation

H Okumura, S Suihkonen, J Lemettinen… - Japanese Journal of …, 2018 - iopscience.iop.org
We report on the electrical characterization of Si-ion implanted AlN layers and the first
demonstration of metal–semiconductor field-effect transistors (MESFETs) with an ion …

Lattice parameters of AlN bulk, homoepitaxial and heteroepitaxial material

D Nilsson, E Janzén… - Journal of Physics D …, 2016 - iopscience.iop.org
Homoepitaxial layers of AlN and heteroepitaxial layers of AlN on 4H-SiC substrates were
grown by metalorganic chemical vapor deposition at high temperatures up to 1400 C, and …

Stable and metastable Si negative-U centers in AlGaN and AlN

XT Trinh, D Nilsson, IG Ivanov, E Janzén… - Applied Physics …, 2014 - pubs.aip.org
Electron paramagnetic resonance studies of Si-doped Al x Ga 1− x N (0.79≤ x≤ 1.0) reveal
two Si negative-U (or DX) centers, which can be separately observed for x≥ 0.84. We found …

Investigation of phosgene adsorption behavior on aluminum nitride nanocones: Density functional study

Z Rostami, H Soleymanabadi - Journal of Molecular Liquids, 2017 - Elsevier
The adsorption of phosgene molecule on two kinds of AlN nanocones (AlN-Al and AlN-N)
was investigated based on the density functional theory calculations. It was found that the …

Dopant species with Al–Si and N–Si bonding in the MOCVD of AlN implementing trimethylaluminum, ammonia and silane

RB Dos Santos, R Rivelino… - Journal of Physics D …, 2015 - iopscience.iop.org
We have investigated gas-phase reactions driven by silane (SiH 4), which is the dopant
precursor in the metalorganic chemical vapor deposition (MOCVD) of aluminum nitride (AlN) …

A first-principles study of gas adsorption on monolayer AlN sheet

Y Wang, N Song, X Song, T Zhang, D Yang, M Li - Vacuum, 2018 - Elsevier
The monolayer AlN is one of graphene-like 2D material. On the basis of density functional
theory (DFT) calculations, the adsorption of CO 2, CO, H 2, N 2, CH 4, O 2 and NO on the …