Atomic layer deposition (ALD) has become an indispensable thin-film technology in the
contemporary microelectronics industry. The unique self-limited layer-by-layer growth …

Atomic layer deposition (ALD) is a method of choice for the growth of highly conformal thin
films with accurately controlled thickness on planar and nanostructured surfaces. These …

Two critical issues associated with semi-transparent, n–i–p perovskite solar cells for 2-
terminal tandem devices are parasitic absorption and long-term instability associated with …

V 2 O 5 is one of the best material for many applications. Progress is currently made to
improve its performance for use as a sensor, or an electrode, or smart window …

Atomic layer deposition was adopted to deposit VO x thin films using vanadyl tri-
isopropoxide {VO [O (C3H7)] 3, VTIP} and water (H2O) at 135° C. The self-limiting and purge …

Vanadium dioxide emerges as an appealing material for smart thermal management and
electrical/optical switching owing to its abrupt semiconductor-to-metal transition (SMT) at …

Vanadium oxide (VO X) is a promising material for developing the sensor film of uncooled
microbolometers. However, amorphous VO X film, which is typically formed on the Si …

In the present study, the V2O5 films synthesized by plasma-enhanced atomic layer
deposition on p-Si and fluorinated graphene on Si (or FG/Si) substrates were analyzed for …

Phase selective chemical vapor deposition of nanostructured vanadium dioxide (VO2) and
sesquioxide (V2O3) was achieved by deploying [V (OR) 4] n (R= t Bu, n= 1 (1), R= Et, n= 3 …

Photonic crystals (PhCs) are optical structures characterized by the spatial modulation of the
dielectric function, which results in the formation of a photonic band gap (PBG) in the …