Automated semiconductor defect inspection in scanning electron microscope images: a systematic review

T Lechien, E Dehaerne, B Dey, V Blanco… - arXiv preprint arXiv …, 2023 - arxiv.org
A growing need exists for efficient and accurate methods for detecting defects in
semiconductor materials and devices. These defects can have a detrimental impact on the …

A survey of yield modeling and yield enhancement methods

L Milor - IEEE transactions on semiconductor manufacturing, 2013 - ieeexplore.ieee.org
Fast yield learning is critical to bringing products to the market in a timely fashion and is
strongly linked to product revenues. This paper reviews methods to enable efficient yield …

In-line defect reduction from a historical perspective and its implications for future integrated circuit manufacturing

RL Guldi - IEEE transactions on semiconductor manufacturing, 2004 - ieeexplore.ieee.org
The enormous progress in integrated circuit manufacturing over the last 30 years would
have been impossible without the science of yield enhancement and defect reduction. This …

Electron Microscopy-based Automatic Defect Inspection for Semiconductor Manufacturing: A Systematic Review

E Dehaerne, B Dey, V Blanco, J Davis - arXiv preprint arXiv:2409.06833, 2024 - arxiv.org
In this review, automatic defect inspection algorithms that analyze Electron Microscope (EM)
images of Semiconductor Manufacturing (SM) products are identified, categorized, and …

SEM defect review and classification for semiconductor device manufacturing

Z Abraham - Metrology-Based Control for Micro-Manufacturing, 2001 - spiedigitallibrary.org
Manufacturing of semiconductor devices is an extremely complicated, time consuming, multi-
stage process. In order to maintain acceptable yield levels, the production line must be …

Optimizing automatic defect classification feature and classifier performance for post-fab yield analysis

MA Hunt, TP Karnowski, C Kiest… - 2000 IEEE/SEMI …, 2000 - ieeexplore.ieee.org
In this paper we present a methodology for enhanced automatic defect classification (ADC)
of defects optically detected during post fab inspection and present results from production …

In-line SEM based ADC for advanced process control

W Tomlinson, B Halliday, D Farrington… - 2000 IEEE/SEMI …, 2000 - ieeexplore.ieee.org
SEM review is increasingly being utilized for defect analysis and classification. Root cause
analysis typically required both detailed defect imaging and elemental analysis. The use of …

Use of test structures for Cu interconnect process development and yield enhancement

A Skumanich, MP Cai, J Educato… - … 2000. Proceedings of …, 2000 - ieeexplore.ieee.org
A methodology is described where wafers with specialized test structures are inspected with
wafer metrology tools to assist process development for Cu BEOL fabrication. A Cu …

印刷電路板內層之自動缺陷偵測與分類系統

鄭喆夫, 王啟旭 - 2012 - ir.lib.nycu.edu.tw
本論文實現了一套結合缺陷偵測與分類的自動化缺陷分類系統. 缺陷偵測的部分,
我們必須先利用MAD 的方法將待測影像與參考影像對齊, 其中參考影像為不包含缺陷的影像 …

Automatic defect classification using topography map from SEM photometric stereo

SD Serulnik, J Cohen, B Sherman… - Data Analysis and …, 2004 - spiedigitallibrary.org
As the industry moves to smaller design rules, shrinking process windows and shorter
product lifecycles, the need for enhanced yield management methodology is increasing …