Abstract Titanium Nitride (TiN) is widely used in many industrial sectors for its outstanding
performances including its mechanical properties, high chemical and thermal stability …

This study demonstrates a cost-effective method for planar titanium nitride plasmonic film by
nitriding spin-coated TiO 2 in ammonia atmosphere. The effect of nitridation temperature on …

This work consists of optimizing TiN plasma-enhanced atomic layer deposition using two
different N-sources: NH 3 and N 2. In addition to maximizing the growth per cycle (GPC) and …

A study is presented on the synthesis of reaction-mixed nitride nanopowders in the
reference system of aluminium nitride AlN, gallium nitride GaN, and titanium nitride TiN (Al …

Presented is a study on the preparation, via original precursor solution chemistry, of
intimately mixed composite nanocrystalline powders in the system gallium nitride GaN …

Presented is a study on the original preparation of individual and in situ intimately mixed
composite nanocrystalline powders in the titanium nitride-aluminum nitride system, Ti: Al= 1 …

The development of efficient catalyst materials that can drive high catalytic performance is
challenging. Here, we report a well-defined hollow mesoporous TiN nanostructure for use as …

内容の要旨 (Abstract) The objective of this thesis is to investigate the methods of preparing
TiN, one of the essential refractory materials and industrially used, to obtain the product with …