Mirrors are a subset of optical components essential for the success of current and future
space missions. Most of the telescopes for space programs ranging from earth observation …

Featured Application This work finds application in Extreme Ultraviolet (EUV) lithography in
general. More specifically, the results may impact the development of EUV optical …

Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV)
lithography was experimentally studied. A carbon film was found to have grown under …

EUV lithography has a promising application, but carbon contamination limits its efficiency
and service lifetime. The key issue is how to remove carbon contaminations efficiently and …

THM van de Ven, P. Reefman, CA de Meijere, RM van der Horst, M. van Kampen, VY
Banine, J. Beckers; Ion energy distributions in highly transient EUV induced plasma in …

In this work, the role of three kinds of strain, such as volumetric, biaxial and shear strain, in
the dissolution and diffusion of Hydrogen (H) in Ruthenium (Ru) were studied by using first …

A new diagnostic approach using multi-mode microwave cavity resonance spectroscopy
(MCRS) is introduced. This can be used to determine electron dynamics non-invasively in …

We report on blister formation in nanometer thick Mo/Si multilayer structures due to exposure
to hydrogen ion fluxes. The influence of hydrogen flux and ion energy for blister formation …

Extreme Ultraviolet (EUV) optical components used in EUV lithography tools are
continuously impacted by an exotic and highly transient type of plasma: EUV-induced …

Hydrocarbon contamination is associated with light transmission losses in modern
lithography machines, which contain extreme-ultraviolet-induced plasma. A volume …