We report a novel method of producing composite substrates by growing diamond films on a
4H–SiC substrate by microwave plasma chemical vapor deposition to enhance the thermal …

The detailed experimental behavior of a microwave plasma assisted chemical vapor
deposition (MPACVD) reactor operating within the high, 180–300torr, pressure regime is …

The design and performance of an improved microwave plasma assisted chemical vapor
deposition (MPACVD) reactor is described. This reactor operates with high power densities …

Diamond offers a range of unique properties, including wide band of optical transmission,
highest thermal conductivity, stiffness, wear resistance and superior electronic properties …

Microwave plasma assisted synthesis of diamond is experimentally investigated using high
purity, 2–5% CH4/H2 input gas chemistries and operating at high pressures of 180–240Torr …

Employing a broad parameter study, friction and wear properties of amorphous carbon
coatings (aC), tetrahedral amorphous carbon coatings (ta-C) and single crystalline diamond …

In this paper, we report on microwave CVD deposition of high quality polycrystalline
diamond and on related post-processing steps to produce smooth, flat and uniformly thick …

A multiple substrate, microwave plasma-assisted chemical vapor deposition synthesis
process for single crystal diamond (SCD) is demonstrated using a 915 MHz reactor …

The substrate growth temperature dependence of the plasma gas-phase to solid-phase
doping efficiency in single crystal, boron doped diamond (BDD) deposition is investigated …

High quality single crystal diamond (SCD) substrates are required for several different
important current applications. Microwave Plasma Assisted Chemical Vapor Deposition …