This review paper covers a topic of significant importance in micro-and nano-systems
development and manufacturing, specifically the residual stresses in deposited thin-film …

The fabrication of next-generation semiconductor devices has created a need for low-
temperature (≤ 400 C) deposition of highly-conformal (> 95%) SiO 2, SiN x, and SiC films …

Here's the book to keep handy when you have to overcome obstacles in design, simulation,
fabrication and application of MEMS sensors. This practical guide to design tools and …

This paper presents a novel process for the fabrication of out-of-plane hollow microneedles
in silicon. The fabrication method consists of a sequence of deep-reactive ion etching …

An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has
been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion …

A new method for the fabrication of micro structures for fluidic applications, such as
channels, cavities, and connector holes in the bulk of silicon wafers, called buried channel …

Varied SiN x films have been deposited by low pressure chemical vapor deposition from
silane SiH 4 and ammonia NH 3 and the influences of the deposition parameters …

Applied quantum optics stands to revolutionise many aspects of information technology,
provided performance can be maintained when scaled up. Silicon quantum photonics …

Silicon nitride is a well-established material for photonic devices and integrated circuits. It
displays a broad transparency window spanning from the visible to the mid-IR and …

A novel microbridge testing method for thin films is proposed. Theoretic analysis and finite
element calculation are conducted on microbridge deformation to provide a closed formula …