Measurement of temperature in active high-power AlGaN/GaN HFETs using Raman spectroscopy

M Kuball, JM Hayes, MJ Uren, I Martin… - IEEE Electron …, 2002 - ieeexplore.ieee.org
We report on the noninvasive measurement of temperature, ie, self-heating effects, in active
AlGaN/GaN HFETs grown on sapphire and SiC substrates. Micro-Raman spectroscopy was …

SiC and GaN transistors-is there one winner for microwave power applications?

RJ Trew - Proceedings of the IEEE, 2002 - ieeexplore.ieee.org
Wide bandgap semiconductors show promise for high-power microwave electronic devices.
Primarily due to low breakdown voltage, it has not been possible to design and fabricate …

[HTML][HTML] New applications advisable for gallium nitride

SJ Pearton, CR Abernathy, ME Overberg, GT Thaler… - Materials today, 2002 - Elsevier
GaN-based visible light-emitting diodes and laser diodes are already commercialized for a
variety of lighting and data storage applications. This materials system is also showing …

–metal–insulator–semiconductor heterostructure field–effect transistors

X Hu, A Koudymov, G Simin, J Yang, MA Khan… - Applied Physics …, 2001 - pubs.aip.org
We report on a metal–insulator–semiconductor heterostructure field-effect transistor
(MISHFET) using Si 3 N 4 film simultaneously for channel passivation and as a gate …

Measurement of temperature distribution in multifinger AlGaN/GaN heterostructure field-effect transistors using micro-Raman spectroscopy

M Kuball, S Rajasingam, A Sarua, MJ Uren… - Applied physics …, 2003 - pubs.aip.org
The temperature distribution in multifinger high-power AlGaN/GaN heterostructure field-
effect transistors grown on SiC substrates was studied. Micro-Raman spectroscopy was …

[图书][B] Gallium nitride processing for electronics, sensors and spintronics

SJ Pearton, CR Abernathy, F Ren - 2006 - books.google.com
Semiconductor spintronics is expected to lead to a new generation of transistors, lasers and
integrated magnetic sensors that can be used to create ultra-low power, high speed …

AlGaN/GaN metal–oxide–semiconductor high electron mobility transistors using Sc2O3 as the gate oxide and surface passivation

R Mehandru, B Luo, J Kim, F Ren, BP Gila… - Applied physics …, 2003 - pubs.aip.org
We demonstrated that Sc2O3 thin films deposited by plasma-assisted molecular-beam
epitaxy can be used simultaneously as a gate oxide and as a surface passivation layer on …

Field-plate engineering for HFETs

S Karmalkar, MS Shur, G Simin… - IEEE Transactions on …, 2005 - ieeexplore.ieee.org
This paper reports on the analytical approach for designing field plates for reducing the
electric field in the channel and at the surface of heterostructure field-effect transistors …

Novel insulators for gate dielectrics and surface passivation of GaN-based electronic devices

BP Gila, F Ren, CR Abernathy - Materials Science and Engineering: R …, 2004 - Elsevier
The use of gate insulators for compound semiconductor electronics would alleviate many of
the problems encountered in current Schottky based devices. Further, circuit design can be …

DC and RF performance of proton-irradiated AlGaN/GaN high electron mobility transistors

B Luo, JW Johnson, F Ren, KK Allums… - Applied Physics …, 2001 - pubs.aip.org
AlGaN/GaN high electron mobility transistors (HEMTs) with a range of gate lengths (0.8–1.2
μm) and widths (100–200 μm) were exposed to 40 MeV protons at fluences of 5× 10 9 or 5× …