We review the thin film growth, chemistry, and physical properties of Group 4–6 transition-
metal diboride (TMB 2) thin films with AlB 2-type crystal structure (Strukturbericht designation …

The quality of thin films represents the key to any improvement made in the device
components manufacturing, and the way to obtain this quality based on deposition …

We report on a systematic study of the effect of pulse length (ton= 25− 200 μ s), and peak
target current density (JT, peak= 0.25− 2.0 A/cm 2) during HiPIMS deposition of AlB 2-phase …

Following the development of various complex optical elements, especially those involving
aluminum alloys with several free-form surfaces, it is critical to understand the material …

In this paper, three large scalar high-purity solid copper targets with different grain sizes are
sputtered under the same experimental conditions. The sputter etching mechanism of grains …

Of prime prominence in modification of growing films in magnetron sputtering is the energy
of arriving species onto the substrate; however, the effect of discharge voltage on such an …

Titanium boride, TiB x, thin films were grown by direct current magnetron co-sputtering from
a compound TiB 2 target and a Ti target at an Ar pressure of 2.2 mTorr (0.3 Pa) and …

Despite AlB 2 is the most typical structure prototype of transition metal diborides (TMB 2),
studies on AlB 2 thin films are scarce. Furthermore, although Al is the primary alloying …

Planar defect structures appearing in transition metal diboride (TMB 2) thin films, grown by
different magnetron sputtering-deposition approaches over a wide compositional and …

A fast, convenient, and easy to perform method for preparing plan‐view transmission
electron microscopy (TEM) specimens of brittle materials is proposed. The method is ideal …