Soft metrology based on machine learning: a review
M Vallejo, C De La Espriella… - Measurement …, 2019 - iopscience.iop.org
Soft metrology has been defined as a set of measurement techniques and models that allow
the objective quantification of properties usually determined by human perception such as …
the objective quantification of properties usually determined by human perception such as …
Plasma information-based virtual metrology (PI-VM) and mass production process control
In this paper, we review the development of plasma engineering technology that improves
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …
A deep convolutional autoencoder-based approach for anomaly detection with industrial, non-images, 2-dimensional data: A semiconductor manufacturing case study
In manufacturing industries, it is of fundamental importance to detect anomalies in
production in order to meet the required quality goals and to limit the number of defective …
production in order to meet the required quality goals and to limit the number of defective …
Use of plasma information in machine-learning-based fault detection and classification for advanced equipment control
DH Kim, SJ Hong - IEEE Transactions on Semiconductor …, 2021 - ieeexplore.ieee.org
For advanced equipment control, two schemata of real-time fault detection were performed
using machine learning algorithms in silicon etching in SF 6/O 2/Ar plasma. Fault detection …
using machine learning algorithms in silicon etching in SF 6/O 2/Ar plasma. Fault detection …
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
In the semiconductor etch process, as the critical dimension (CD) decreases and the
difficulty of the process control increases, in-situ and real-time etch profile monitoring …
difficulty of the process control increases, in-situ and real-time etch profile monitoring …
Product-to-product virtual metrology of color filter processes in panel industry
SKS Fan, XW Chang, YY Lin - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
The current thin film transistor liquid crystal display (TFT-LCD) panel industry evolves in
transition from volume production to customized production service as a major competition …
transition from volume production to customized production service as a major competition …
Machine learning based CVD virtual metrology in mass produced semiconductor process
Y Xie, R Stearrett - arXiv preprint arXiv:2107.05071, 2021 - arxiv.org
A cross-benchmark has been done on three critical aspects, data imputing, feature selection
and regression algorithms, for machine learning based chemical vapor deposition (CVD) …
and regression algorithms, for machine learning based chemical vapor deposition (CVD) …
Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma
Ion-induced etch damage on trench surfaces of Ge 2 Sb 2 Te 5 (GST) by reactive ion etching
(RIE) is investigated with Ar/SF 6 capacitively coupled plasma (CCP). Etch damage on the …
(RIE) is investigated with Ar/SF 6 capacitively coupled plasma (CCP). Etch damage on the …
Computational characterization of microwave planar cutoff probes for non-invasive electron density measurement in low-temperature plasma: Ring-and bar-type cutoff …
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure
the cutoff frequency in a transmission (S21) spectrum. For real-time electron density …
the cutoff frequency in a transmission (S21) spectrum. For real-time electron density …
A hierarchical model-based method for wafer level virtual metrology under process information deficiency
YJ Liu, D Ni, X Shao, DL Gong, JJ Li - Quality Engineering, 2024 - Taylor & Francis
Online inspection is one of the most critical processes of quality control in semiconductor
manufacturing. The physical inspection methods for wafers are time-consuming and unable …
manufacturing. The physical inspection methods for wafers are time-consuming and unable …