Physics of laser-driven tin plasma sources of EUV radiation for nanolithography

OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …

Laser induced breakdown spectroscopy methods and applications: A comprehensive review

SKH Shah, J Iqbal, P Ahmad, MU Khandaker… - Radiation physics and …, 2020 - Elsevier
Laser induced breakdown spectroscopy has become an established analytical atomic
emission spectroscopic technique. It has analytical and technical advantages over other …

Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser

L Behnke, R Schupp, Z Bouza, M Bayraktar… - Optics express, 2021 - opg.optica.org
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …

Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)

OO Versolato, J Sheil, S Witte, W Ubachs… - Journal of …, 2022 - iopscience.iop.org
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …

Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma

R Schupp, F Torretti, RA Meijer, M Bayraktar… - Physical Review …, 2019 - APS
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …

The influence of spot size on the expansion dynamics of nanosecond-laser-produced copper plasmas in atmosphere

X Li, W Wei, J Wu, S Jia, A Qiu - Journal of Applied Physics, 2013 - pubs.aip.org
Laser produced copper plasmas of different spot sizes in air were investigated using fast
photography and optical emission spectroscopy (OES). The laser energy was 33 mJ. There …

激光等离子体13.5 nm 极紫外光刻光源进展

宗楠, 胡蔚敏, 王志敏, 王小军, 张申金, 薄勇… - 中国光学(中 …, 2020 - chineseoptics.net.cn
半导体产业是高科技, 信息化时代的支柱. 光刻技术, 作为半导体产业的核心技术之一,
已成为世界各国科研人员的重点研究对象. 本文综述了激光等离子体13.5 nm …

Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm

T Otsuka, D Kilbane, J White, T Higashiguchi… - Applied Physics …, 2010 - pubs.aip.org
We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the
6.5–6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B 4 C …

The effect of excitation wavelength on dynamics of laser-produced tin plasma

SS Harilal, T Sizyuk, A Hassanein, D Campos… - Journal of Applied …, 2011 - pubs.aip.org
We investigated the effect of the excitation wavelength on the density evolution of laser-
produced tin plasmas, both experimentally and numerically. For producing plasmas, Sn …

[HTML][HTML] Radiation transport and scaling of optical depth in Nd: YAG laser-produced microdroplet-tin plasma

R Schupp, F Torretti, RA Meijer, M Bayraktar… - Applied Physics …, 2019 - pubs.aip.org
Experimental scaling relations of the optical depth are presented for the emission spectra of
a tin-droplet-based, 1-μm-laser-produced plasma source of extreme-ultraviolet (EUV) light …