[HTML][HTML] Resistive switching phenomena: A review of statistical physics approaches

JS Lee, S Lee, TW Noh - Applied Physics Reviews, 2015 - pubs.aip.org
Resistive switching (RS) phenomena are reversible changes in the metastable resistance
state induced by external electric fields. After discovery∼ 50 years ago, RS phenomena …

[PDF][PDF] Anatomy of a nanoscale conduction channel reveals the mechanism of a high-performance memristor

F Miao, JP Strachan, JJ Yang, MX Zhang, I Goldfarb… - Adv. Mater, 2011 - academia.edu
Present memory technologies, including DRAM (dynamic random access memory), SRAM
(static random access memory), and flash, are potentially approaching their scalability limits …

Tuning the switching behavior of binary oxide-based resistive memory devices by inserting an ultra-thin chemically active metal nanolayer: a case study on the Ta 2 O …

S Gao, F Zeng, M Wang, G Wang, C Song… - Physical Chemistry …, 2015 - pubs.rsc.org
The common nonpolar switching behavior of binary oxide-based resistive random access
memory devices (RRAMs) has several drawbacks in future application, such as the …

Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures

H Jiang, XY Li, R Chen, XL Shao, JH Yoon, X Hu… - Scientific Reports, 2016 - nature.com
SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality
was recently extended to resistance switching random access memory, where the defective …

Resistive switching behavior of photochemical activation solution-processed thin films at low temperatures for flexible memristor applications

X Wu, Z Xu, Z Yu, T Zhang, F Zhao, T Sun… - Journal of Physics D …, 2015 - iopscience.iop.org
This study explores deep ultraviolet photochemically activated solution-processed metal-
oxide thin films at room temperature for fabrication of flexible memristor active resistive …

Thin TiO x layer as a voltage divider layer located at the quasi-Ohmic junction in the Pt/Ta 2 O 5/Ta resistance switching memory

XY Li, XL Shao, YC Wang, H Jiang, CS Hwang… - Nanoscale, 2017 - pubs.rsc.org
Ta2O5 has been an appealing contender for the resistance switching random access
memory (ReRAM). The resistance switching (RS) in this material is induced by the repeated …

Metallic materials deposition: metal‐organic precursors

CH Winter, TJ Knisley, LC Kalutarage… - … of Inorganic and …, 2011 - Wiley Online Library
This review describes metal‐organic precursors for the growth of metal‐containing thin films
by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors …

Forming mechanism of the bipolar resistance switching in double-layer memristive nanodevices

SB Lee, HK Yoo, K Kim, JS Lee, YS Kim, S Sinn… - …, 2012 - iopscience.iop.org
To initiate resistance switching phenomena, it is usually necessary to apply a strong electric
field to a sample. This forming process poses very serious obstacles in real nanodevice …

Modeling of current conduction during RESET phase of Pt/Ta2O5/TaOx/Pt bipolar resistive RAM devices

AL Jagath, TN Kumar… - 2018 IEEE 7th Non-Volatile …, 2018 - ieeexplore.ieee.org
This paper presents an enhanced analytical model for bipolar resistive switching in
Pt/Ta2O5/TaOx/Pt Resistive Random-Access Memory (RRAM) devices. The conduction …

Comparison between Pt/TiO2/Pt and Pt/TaOX/TaOY/Pt based bipolar resistive switching devices

PWC Ho, FO Hatem, HAF Almurib… - Journal of …, 2016 - iopscience.iop.org
Nonvolatile memories have emerged in recent years and have become a leading candidate
towards replacing dynamic and static random-access memory devices. In this article, the …