Present memory technologies, including DRAM (dynamic random access memory), SRAM (static random access memory), and flash, are potentially approaching their scalability limits …
S Gao, F Zeng, M Wang, G Wang, C Song… - Physical Chemistry …, 2015 - pubs.rsc.org
The common nonpolar switching behavior of binary oxide-based resistive random access memory devices (RRAMs) has several drawbacks in future application, such as the …
H Jiang, XY Li, R Chen, XL Shao, JH Yoon, X Hu… - Scientific Reports, 2016 - nature.com
SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality was recently extended to resistance switching random access memory, where the defective …
X Wu, Z Xu, Z Yu, T Zhang, F Zhao, T Sun… - Journal of Physics D …, 2015 - iopscience.iop.org
This study explores deep ultraviolet photochemically activated solution-processed metal- oxide thin films at room temperature for fabrication of flexible memristor active resistive …
Ta2O5 has been an appealing contender for the resistance switching random access memory (ReRAM). The resistance switching (RS) in this material is induced by the repeated …
CH Winter, TJ Knisley, LC Kalutarage… - … of Inorganic and …, 2011 - Wiley Online Library
This review describes metal‐organic precursors for the growth of metal‐containing thin films by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors …
To initiate resistance switching phenomena, it is usually necessary to apply a strong electric field to a sample. This forming process poses very serious obstacles in real nanodevice …
This paper presents an enhanced analytical model for bipolar resistive switching in Pt/Ta2O5/TaOx/Pt Resistive Random-Access Memory (RRAM) devices. The conduction …
Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices. In this article, the …