Wurtzite and fluorite ferroelectric materials for electronic memory

KH Kim, I Karpov, RH Olsson III, D Jariwala - Nature Nanotechnology, 2023 - nature.com
Ferroelectric materials, the charge equivalent of magnets, have been the subject of
continued research interest since their discovery more than 100 years ago. The …

Fluorite‐Structured Ferroelectric and Antiferroelectric Materials: A Gateway of Miniaturized Electronic Devices

F Ali, T Ali, D Lehninger, A Sünbül… - Advanced Functional …, 2022 - Wiley Online Library
Ferroelectric (FE) and antiferroelectric (AFE) materials are used for several memory‐related
and energy‐related applications. Perovskite materials (eg, bulk ceramics) remain the most …

Roadmap on ferroelectric hafnia-and zirconia-based materials and devices

JPB Silva, R Alcala, UE Avci, N Barrett, L Bégon-Lours… - APL Materials, 2023 - pubs.aip.org
Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development
over the last decade, pushing them to the forefront of ultralow-power electronic systems …

The doping effect on the intrinsic ferroelectricity in hafnium oxide-based nano-ferroelectric devices

Z Li, J Wei, J Meng, Y Liu, J Yu, T Wang, K Xu, P Liu… - Nano Letters, 2023 - ACS Publications
Hafnium oxide (HfO2)-based ferroelectric tunnel junctions (FTJs) have been extensively
evaluated for high-speed and low-power memory applications. Herein, we investigated the …

Ferroelectricity in HfO2 from a Coordination Number Perspective

JH Yuan, GQ Mao, KH Xue, N Bai, C Wang… - Chemistry of …, 2022 - ACS Publications
Ferroelectricity observed in thin-film HfO2, either doped with Si, Al, and so forth or in the Hf0.
5Zr0. 5O2 form, has gained great technical significance. While a trilinear coupling between …

[HTML][HTML] Synergetic contributions of chemical doping and epitaxial stress to polarization in ferroelectric HfO2 films

T Song, H Tan, AC Robert, S Estandia, J Gázquez… - Applied Materials …, 2022 - Elsevier
Literature is rich on the study of different strategies to tailor ferroelectric properties of HfO 2.
Among them, chemical doping is the most studied. La doped HfO 2 films have attracted …

An Aqueous Route to Oxygen-Deficient Wake-Up-Free La-Doped HfO2 Ferroelectrics for Negative Capacitance Field Effect Transistors

P Pujar, H Cho, YH Kim, N Zagni, J Oh, E Lee… - ACS …, 2023 - ACS Publications
The crucial role of nanocrystalline morphology in stabilizing the ferroelectric orthorhombic
(o)-phase in doped-hafnia films is achieved via chemical solution deposition (CSD) by …

Wake-up-free properties and high fatigue resistance of HfxZr1− xO2-based metal–ferroelectric–semiconductor using top ZrO2 nucleation layer at low thermal budget …

T Onaya, T Nabatame, M Inoue, T Sawada, H Ota… - APL Materials, 2022 - pubs.aip.org
The discovery of ferroelectricity in HfO2-based thin films in 2011 1, 2 introduced the
possibility of integrating and scaling ferroelectric memory devices with three-dimensional …

Highly Enhanced Polarization Switching Speed in HfO2‐based Ferroelectric Thin Films via a Composition Gradient Strategy

P Hao, S Zheng, B Zeng, T Yu, Z Yang… - Advanced Functional …, 2023 - Wiley Online Library
The next‐generation semiconductor memories are essentially required for the
advancements in modern electronic devices. Ferroelectric memories by HfO2‐based …

Emerging Opportunities for Ferroelectric Field‐Effect Transistors: Integration of 2D Materials

F Yang, HK Ng, X Ju, W Cai, J Cao… - Advanced Functional …, 2024 - Wiley Online Library
The rapid development in information technologies necessitates rapid advancements of
their supporting hardware. In particular, new computing paradigms are needed to overcome …