Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

In capacitance-voltage (CV) measurements, frequency dispersion in high-k dielectrics is
often observed. The frequency dependence of the dielectric constant (k-value), that is the …

Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific
compositions with precise structures and controlled interfaces. This will enable the …

A heterobimetallic cobalt–aluminum complex was immobilized onto the metal organic
framework NU-1000 using a simple solution-based deposition procedure. Characterization …

Focused electron beam-induced deposition (FEBID) is capable of producing metal-
containing nanostructures with lateral resolution on the sub-nanometer scale. Practical …

Metalorganic chemical vapour deposition (MOCVD) is an attractive technique for the
deposition of dielectric and ferroelectric oxide thin films such as ZrO2, HfO2, Hf-aluminate …

Thin films of multiferroic gadolinium orthoferrite (GdFeO 3) are of significant interest due to
intrinsic coupling of magnetic and ferroelectric order in their monolithic bimetallic structures …

We report the development of a novel portable atomic layer deposition chemical vapor
deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of …

Thin film technology, based on different chemical and physical methods, enabled
miniaturization, co-integration, and amelioration of the performance of the devices. Chemical …