Method and apparatus for angular-resolved spectroscopic lithography characterization
AJM Den Boef, AJ Bleeker… - US Patent …, 2010 - Google Patents
An apparatus and method to determine a property of a substrate by measuring, in the pupil
plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation …
plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation …
Method and apparatus for angular-resolved spectroscopic lithography characterization
AJ Den Boef, M Dusa, AGM Kiers… - US Patent …, 2010 - Google Patents
(54) METHOD AND APPARATUS FOR 5,412,473 A* 5/1995 Rosencwaig et al......... 356,451
ANGULAR-RESOLVED SPECTROSCOPC 5,541,731 A 7/1996 Freedenberg et al …
ANGULAR-RESOLVED SPECTROSCOPC 5,541,731 A 7/1996 Freedenberg et al …
Methods and systems for determining a critical dimension and a thin film characteristic of a specimen
M Nikoonahad, A Levy, KA Brown, G Bultman… - US Patent …, 2003 - Google Patents
2002-03-05 Assigned to KLA-TENCOR, INC. reassignment KLA-TENCOR, INC.
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2012 - Google Patents
Methods and systems for monitoring semiconductor fabrication processes are provided. A
system may include a stage configured to support a specimen and coupled to a …
system may include a stage configured to support a specimen and coupled to a …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2010 - Google Patents
Methods and systems for monitoring semiconductor fabrication processes are provided. A
system may include a stage configured to support a specimen and coupled to a …
system may include a stage configured to support a specimen and coupled to a …
Methods and systems for determining at least four properties of a specimen
M Nikoonahad, A Levy, KA Brown, G Bultman… - US Patent …, 2004 - Google Patents
Methods and systems for monitoring semiconductor fabrication processes are provided. A
system may include a stage configured to support a specimen and coupled to a …
system may include a stage configured to support a specimen and coupled to a …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, G Bultman, M Nikoonahad… - US Patent …, 2005 - Google Patents
2002-03-14 Assigned to KLA-TENCOR, INC. reassignment KLA-TENCOR, INC.
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Focused beam spectroscopic ellipsometry method and system
TR Piwonka-Corle, KF Scoffone, X Chen… - US Patent …, 2004 - Google Patents
A method and system for spectroscopic ellipsometry employing reflective optics to measure
a small region of a sample by reflecting radiation (preferably broadband UV, visible, and …
a small region of a sample by reflecting radiation (preferably broadband UV, visible, and …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2013 - Google Patents
2012-05-09 Assigned to KLA-TENCOR TECHNOLOGIES CORPORATION reassignment
KLA-TENCOR TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS …
KLA-TENCOR TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS …
Methods and systems for determining an implant characteristic and a presence of defects on a specimen
M Nikoonahad, A Levy, KA Brown, G Bultman… - US Patent …, 2005 - Google Patents
2002-03-04 Assigned to KLA-TENCOR, INC. reassignment KLA-TENCOR, INC.
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …