Toxic and corrosive solutions are widely used in the preparation of abrasives and chemical
mechanical polishing (CMP) of sapphire wafers, resulting in potential environmental …

This study investigated the material removal mechanism of sapphire wafer with soft-hard
mixed abrasives through mechanical chemical polishing (MCP). The polishing film, which …

The effects of three different types of surfactants, including cationic surfactant
cetyltrimethylammonium bromide (CTAB), anionic surfactant sodium dodecyl benzene …

A novel surface finish process sequence has been developed with a sequential process
employing sol-gel (SG) semi-fixed abrasive polishing tool and gas-liquid assisted chemical …

A study of chemical products formed on sapphire (0001) during chemical–mechanical
polishing is presented. The results demonstrated that the formation and removal of chemical …

Sapphire crystals have been widely used in the fields of national defense and optical
devices due to good chemical stability and high temperature resistance. In this study, the …

This paper studied the feasibility of using green organic base to replace traditional inorganic
base in sapphire UV-CMP. The effects of pH regulators on chemical and mechanical …

With the rapid development of novel optoelectronic devices, an environmentally friendly and
highly efficient polishing technology for SC-sapphire substrates is imminent. In this work, the …

Chemical mechanical polishing (CMP) of sapphire faces greater challenges as the
performance and processing requirements of sapphire devices continue to improve. Amino …

脆性材料加工过程中引入的亚表面损伤, 对材料的使用寿命, 性能, 下道工序的移除量等都有很大
的影响. 为了指导加工工艺, 加强对加工过程的控制, 对材料的亚表面损伤层的检测显得尤为重要 …