The high refractive indexes and low optical losses of dielectrics are preferred for designing
highly efficient metasurfaces with unprecedented wavefront control such as near-unity …

Hydrogenated amorphous dielectric thin films are critical materials in a wide array of
technologies. In this work, we present a thorough investigation of the thermal conductivity of …

This work demonstrates the efficient optical and passivation properties provided by
hydrogenated silicon nitride (SiNx: H) layers deposited in a lab‐scale atmospheric pressure …

Surface processing of materials by atmospheric pressure dielectric barrier discharges
(DBDs) has experienced significant growth in recent years. Considerable research efforts …

The understanding of the properties of silicon nitride (SiN x) deposited by plasma-enhanced
chemical vapor deposition (PECVD) is crucial as this layer is widely used for gate dielectric …

This paper reflects on the future of low‐temperature plasma science in relation to the
manufacturing and novel uses of glass. The text summarizes the current state of the art on …

This paper investigates the transition from α to α–γ-mode of a dual frequency (5 MHz/50
kHz) dielectric barrier discharge (DBD) at atmospheric pressure. The study is based on both …

This work is a contribution to a better understanding of dual frequency discharge at
atmospheric pressure. Based on experiments and numerical modeling, it is focused on radio …

We report effect of nanostructured silicon rich silicon nitride (SRSN) thin films of different
thickness as a top layer on Si-solar cell on various characteristics including efficiency of the …

The rate coefficients for 52 hydrogen shift reactions for silicon nitrides containing up to 6
atoms of silicon and nitrogen have been calculated using the G3//B3LYP composite method …