An inspection system and method that use a differential technique to accurately detect
interface defects at a resolu tion on the order of tens of nanometers or less. Specifically, a …

Embodiments of systems and methods for measuring a surface topography of a
semiconductor chip are disclosed. In an example, a method for measuring a surface …

A substrate inspection apparatus is disclosed. The substrate inspection apparatus according
to the present disclosure may include: a light source configured to radiate laser light onto a …

Embodiments of systems for classifying interference signals are disclosed. In an example, a
system for classifying interference signals includes an interferometer including a light source …

A measurement device is provided for inspecting a bonding zone between samples,
including a low-coherence interferometer illuminated by a polychromatic light source having …

(57) ABSTRACT A surface inspection apparatus and method, and a method of
manufacturing a display device are disclosed. In one aspect, the Surface inspection method …

An apparatus for measuring the surface contour of a target area of a substrate has a light
source to emit a measurement light beam. A beam splitting element defines a measurement …

Crosstalk mitigation among cameras in neighboring monitored workcells is achieved by
computationally defining a noninterference scheme that respects the independent …

US20220260930A1 - Pattern Measurement Device and Pattern Measurement Method -
Google Patents US20220260930A1 - Pattern Measurement Device and Pattern …

Embodiments of systems and methods for measuring a surface topography of a
semiconductor structure are disclosed. In certain examples, a plurality of interference …