Scanning cathodoluminescence microscopy

CM Parish, PE Russell - Advances in Imaging and Electron Physics, 2007 - Elsevier
Publisher Summary Cathodoluminescence (CL) is light emitted by a solid material because
of irradiation by an electron beam. When the spectral distribution of light is studied, CL …

Measurement of temperature-dependent stress in copper-filled silicon vias using polarized Raman spectroscopy

R Sugie, K Kosaka, H Seki, H Hashimoto… - Journal of Applied …, 2013 - pubs.aip.org
An experimental method to determine the temperature dependence of residual stress in
three-dimensional (3D) structures was developed using polarized Raman spectroscopy …

Heterojunction bipolar transistor featuring a stressed implanted collector: Defects formation and impact on functionality

E Brezza, P Dumas, A Gauthier, F Hilario… - Microelectronics …, 2022 - Elsevier
Abstract Optimization of Heterojunction Bipolar Transistors is crucial for improving RF
capabilities of modern BiCMOS technologies. Fully-implanted collectors are meant to reduce …

Semi-quantitative analysis of the depth distribution of radiative recombination centers in silicon power devices by cross-sectional cathodoluminescence

R Sugie, K Inoue, M Yoshikawa - Journal of Applied Physics, 2012 - pubs.aip.org
A procedure to obtain the semi-quantitative depth distribution of radiative recombination
centers in silicon power devices has been developed using cross-sectional …

From Point Defects to Defect Complexes

K Hayashi - Hyperordered Structures in Materials: Disorder in Order …, 2023 - Springer
Most of the materials have dopants to create functionalities. However, due to the high
demands on material functionality in cutting-edge devices, the conventional concept of point …

Impact of gate metal-induced stress on performance modulation in gate-last metal–oxide–semiconductor field-effect transistors

T Matsuki, N Mise, S Inumiya, T Eimori… - Japanese journal of …, 2007 - iopscience.iop.org
The effect of gate metal film stress on the performance of gate-last metal–oxide–
semiconductor field-effect transistors (MOSFETs) with a W/TiN/SiO 2 gate stack was …

Cathodoluminescence Microcharacterization of Radiative Recombination Centers in Lifetime-Controlled Insulated Gate Bipolar Transistors

R Sugie, T Mitani, M Yoshikawa, Y Iwata… - Japanese Journal of …, 2010 - iopscience.iop.org
Cross-sectional cathodoluminescence (CL) measurements were applied to the study of
electron-irradiated punch-through insulated gate bipolar transistors (IGBTs) to investigate …

Residual defects in low-dose arsenic-implanted silicon after high-temperature annealing

A Sagara, M Hiraiwa, A Uedono, N Oshima… - Nuclear Instruments and …, 2014 - Elsevier
We investigated the residual defects in low-dose (10 13 cm− 2) arsenic implanted Si after
high-temperature (1100° C) annealing. The presence of residual damage was successfully …

Applications of Raman, IR, and CL Spectroscopy

M Yoshikawa - … Techniques for Semiconductors: Raman, Infrared, and …, 2023 - Springer
This chapter describes the latest analysis examples, combing Raman, IR, and CL
spectroscopy. Strained Si techniques, such as incorporating SiGe is essential forboost …

[PDF][PDF] Stress Field and Defect Evaluation with Shallow Trench Isolation Structure after Transistor Fabrication Processing by Raman and Cathodoluminescence …

M Kodera, N Tsuchiya, S Kakinuma, N Naka - Stress - academia.edu
Stress engineering related to the frontend process as well as the backend process of LSI is
required [1-7]. As for shallow trench isolation (STI) structures, it was reported that a high …