Highly charged ions: Optical clocks and applications in fundamental physics
MG Kozlov, MS Safronova… - Reviews of Modern …, 2018 - APS
Recent developments in frequency metrology and optical clocks have been based on
electronic transitions in atoms and singly charged ions as references. The control over all …
electronic transitions in atoms and singly charged ions as references. The control over all …
Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
OO Versolato - Plasma Sources Science and Technology, 2019 - iopscience.iop.org
Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
13.5 nm wavelength for next-generation nanolithography, enabling the continued …
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
enable the continued miniaturization of semiconductor devices. The required EUV light, at …
The Heidelberg compact electron beam ion traps
P Micke, S Kühn, L Buchauer, JR Harries… - Review of Scientific …, 2018 - pubs.aip.org
Highly charged ions (HCIs) constitute a large class of atomic systems since each element
has as many ionization states as it has protons—in a sense, this extends the periodic table …
has as many ionization states as it has protons—in a sense, this extends the periodic table …
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …
Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …
plasma over a wide parameter range by varying the diameter of the targeted tin …
ambit: A programme for high-precision relativistic atomic structure calculations
EV Kahl, JC Berengut - Computer Physics Communications, 2019 - Elsevier
We present the amb it software package for general atomic structure calculations. This
software implements particle–hole configuration interaction with many-body perturbation …
software implements particle–hole configuration interaction with many-body perturbation …
Anomalous plasma ionization balance induced by and metastable states
Metastable states in an atomic energy-level structure greatly influence atomic processes in
plasmas. In particular, high-energy long-lived metastable levels brought about by 5 s and 4 f …
plasmas. In particular, high-energy long-lived metastable levels brought about by 5 s and 4 f …
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …