Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry
as the leading-edge lithography technique for continued miniaturization of semiconductor …

Silk protein is being increasingly introduced as a prospective material for biomedical
devices. However, a limited locus to intervene in nature-oriented silk protein makes it …

We introduce a novel fabrication technique for thin film devices, utilizing Focused Ion Beam
micro-machining. Unlike conventional methods requiring post processes such as etching or …

Current chemicals used in electron beam (e-beam) lithography generate safety and waste
management issues. To replace them, chitosan, a natural and abundant polymer soluble in …

An electron beam (EB) lithography method using inedible cellulose-based resist material
derived from woody biomass has been successfully developed. This method allows the use …

Photoresist materials are also used in semiconductor manufacturing and have excellent
properties for fine processing. In recent years, lithography technology has enabled …

We report high-resolution (150 nm) nanopatterning of biodegradable polylactide by thermal
nanoimprint lithography using dichloromethane as a volatile solvent for improving the …

Biopolymers represent natural, renewable and abundant materials. Their use is steadily
growing in various areas (food, health, building…) but, in lithography, despite some works …

Plant-based materials have recently been used as eco-friendly, water-repellent, light-
transparent films for liquid crystal displays and optical devices. An approach using an eco …

The application of natural linear polysaccharide to green resist polymers was demonstrated
for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free …