[HTML][HTML] Challenges and recent prospectives of 3D heterogeneous integration

S Zhang, Z Li, H Zhou, R Li, S Wang, KW Paik… - E-Prime-Advances in …, 2022 - Elsevier
With the continuous reduction of chip feature size, the continuation of Moore's Law becomes
increasingly difficult and heterogeneous integration has become one of the important …

Copper bonding technology in heterogeneous integration

YG Lee, M McInerney, YC Joo, IS Choi… - Electronic Materials …, 2024 - Springer
As semiconductor device scaling faces a severe technical bottleneck, vertical die stacking
technologies have been developed to obtain high performance, high density, low latency …

Ru Passivation Layer Enables Cu–Cu Direct Bonding at Low Temperatures with Oxidation Inhibition

C Jeon, S Kang, ME Kim, J Park, D Kim… - … Applied Materials & …, 2024 - ACS Publications
Stacking semiconductor chips allows for increased packing density within a given footprint
and efficient communication between different functional layers of the chip, leading to higher …

Cu-Cu joint formation by low-temperature sintering of self-reducible Cu nanoparticle paste under ambient condition

Y Yuan, H Wu, J Li, P Zhu, R Sun - Applied Surface Science, 2021 - Elsevier
The development of WBG (wide bandgap) semiconductors has put forward higher
requirements for packaging and interconnection technology. Cu sintering is widely …

Wafer-to-wafer hybrid bonding development by advanced finite element modeling for 3-D IC packages

L Ji, FX Che, HM Ji, HY Li… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
This article focuses on the 3-D modeling methodology development of the wafer-to-wafer
hybrid bonding (W2W-HB) annealing process. With its successful application in a 2-stack …

Electrical and reliability investigation of Cu-to-Cu bonding with silver passivation layer in 3-D integration

TC Chou, SY Huang, PJ Chen, HW Hu… - IEEE Transactions …, 2020 - ieeexplore.ieee.org
In this article, low-temperature Cu–Cu bonding with the Ag passivation layer was
accomplished at 180° C for 3 min without a postannealing process. The Ag passivation layer …

Anti-oxidant copper layer by remote mode N2 plasma for low temperature copper–copper bonding

H Park, H Seo, SE Kim - Scientific reports, 2020 - nature.com
An anti-oxidant Cu layer was achieved by remote mode N2 plasma. Remote mode plasma
treatment offers the advantages of having no defect formation, such as pinholes, by …

Low-temperature (260 C) solderless Cu–Cu bonding for fine-pitch 3-D packaging and heterogeneous integration

H Park, H Seo, Y Kim, S Park… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
Low-temperature solderless Cu-Cu bonding is an important technology for advanced
packaging, such as fine-pitch 3-D packaging and heterogeneous integration. In this study …

Optimization of Cu protrusion of wafer-to-wafer hybrid bonding for HBM packages application

S Wang, H Zhang, Z Tian, T Liu, Y Sun, Y Zhang… - Materials Science in …, 2022 - Elsevier
This work focuses on the effect of Cu protrusion on the reliability of High Bandwidth Memory
(HBM) fabricated by wafer-to-wafer hybrid bonding (W2W-HB) process. The thermal stress …

Advanced Cu/Polymer Hybrid Bonding System for Fine‐Pitch 3D Stacking Devices

J Park, S Kang, ME Kim, NJ Kim, J Kim… - Advanced Materials …, 2023 - Wiley Online Library
Hybrid bonding enables the commercialization of ultra‐fine pitch high‐density 3D packages.
Cu/SiO2 hybrid bonding is the standard packing interface recently introduced in the industry …