In-line metrology for defect inspection is employed for quality control and calibration of data-
driven models for intelligent manufacturing. However, defect inspection is time-consuming …

With the shrinking feature size of integrated circuits driven by continuous technology
migrations for wafer fabrication, the control of tightening critical dimensions is critical for yield …

Silicon wafers are critical raw materials for semiconductor fabrication. Wafer characteristics
and specifications will affect the yield of integrated circuits fabricated on the wafer. As critical …

As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and
alignment accuracy via minimizing overlay errors within the tolerance is crucial. To address …

To improve capital effectiveness in light of demand fluctuation, it is increasingly important for
high-tech companies to develop effective solutions for managing multiple resources …

This article addresses the application of minimax optimization in the control design of
complex dynamic systems of the semiconductor manufacturing. We highlight the main …

As semiconductor industry reached nanotechnology generation and consumer electronics
era, the competition is no longer among individual semiconductor companies. Indeed, the …

This paper presents a novel method for control of overlay errors in photolithography
processes in semiconductor manufacturing. It minimizes the largest overlay error across all …

Semiconductor industry has been one of the most complicated industries driven by Moore's
Law for continuous technology evolution. In order to meet the requirements of high …

This study aims to develop a robust monitoring system for advanced control and
compensation of the overlay errors based on E-insensitive support vector regression (SVR) …