7 Focus Variation Instruments Page 1 7 Focus Variation Instruments Franz Helmli Head of
R&D, Alicona Teslastraße, Grambach Austria Abstract. The focus variation method uses …

Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

A metrological atomic force microscope with a tip-tilting mechanism (tilting-mAFM) has been
developed to expand the capabilities of 3D nanometrology, particularly for high-resolution …

A new critical dimension (CD, often synonymously used for line width) reference material
with improved vertical parallel sidewalls (IVPSs) has been developed and characterised …

Shrinking design rules and reduced process tolerances require tight control of CD linewidth,
feature shape, and profile of the printed geometry. The Holistic Metrology approach consists …

Calibration of magnification and nonlinearity of scanning electron microscopy (SEM) is an
essential task. In this paper, we proposed a new type of 1D grating sample fabricated by …

At this time, there is no instrument capable of measuring a nano-object along the three
spatial dimensions with a controlled uncertainty. The combination of several instruments is …

Traceability is a fundamental issue for nanoscale dimensional metrology. The lack of
traceability in measurements inhibits the comparison of tools from different manufacturers …

A new three-dimensional atomic force microscopy (3D-AFM) for true 3D measurements of
nanostructures has been developed at Physikalisch Technische Bundesanstalt (PTB), the …

Recently, there has been significant research investigating new optical technologies for
dimensional metrology of features 22 nm in critical dimension and smaller. When modeling …