Epitaxial growth and layer-transfer techniques for heterogeneous integration of materials for electronic and photonic devices

H Kum, D Lee, W Kong, H Kim, Y Park, Y Kim… - Nature …, 2019 - nature.com
The demand for improved electronic and optoelectronic devices has fuelled the
development of epitaxial growth techniques for single-crystalline semiconductors. However …

[HTML][HTML] Two-dimensional material templates for van der Waals epitaxy, remote epitaxy, and intercalation growth

H Ryu, H Park, JH Kim, F Ren, J Kim, GH Lee… - Applied Physics …, 2022 - pubs.aip.org
Epitaxial growth, a crystallographically oriented growth induced by the chemical bonding
between crystalline substrate and atomic building blocks, has been a key technique in the …

Nanoscale Raman mapping of elastic stresses in multilayer heterostructure based on multi-period GaN/AlN superlattices grown using HVPE technology on hybrid SiC …

PV Seredin, SS Sharofidinov, DL Goloshchapov… - Optical Materials, 2024 - Elsevier
For the first time, a multilayer heterostructure consisting of periodically arranged GaN and
AlN layers was formed by chloride-hydride gas-phase epitaxy on a SiC/Si hybrid substrate …

Heterogeneous integration toward a monolithic 3-D chip enabled by III–V and Ge materials

SH Kim, SK Kim, JP Shim, DM Geum… - IEEE Journal of the …, 2018 - ieeexplore.ieee.org
Monolithic 3-D integration has emerged as a promising technological solution for traditional
transistor scaling limitations and interconnection bottleneck. The challenge we must …

Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi …

PV Seredin, DL Goloshchapov, NA Kurilo, AO Radam… - Optical Materials, 2023 - Elsevier
Problems of the growth of nanoscale columnar Al x Ga 1-x N/AlN heterostructures on hybrid
substrates involving porous silicon and silicon carbide layers by molecular beam epitaxy …

Monolithic integration of Si-CMOS and III-V-on-Si through direct wafer bonding process

KH Lee, Y Wang, B Wang, L Zhang… - IEEE Journal of the …, 2017 - ieeexplore.ieee.org
Integration of silicon-complementary metal oxide-semiconductor (Si-CMOS) and III-V
compound semiconductors (with device structures of either InGaAs HEMT, AlGaInP LED …

Preventing phase separation in MOCVD-grown InAlAs compositionally graded buffer on silicon substrate using InGaAs interlayers

D Kohen, XS Nguyen, RI Made, C Heidelberger… - Journal of Crystal …, 2017 - Elsevier
Compositionally graded InAlAs buffers grown by metal–organic chemical vapor deposition
are impaired by phase separation occurring at In content higher than 35%. Phase …

Hetero-epitaxy of high quality germanium film on silicon substrate for optoelectronic integrated circuit applications

KH Lee, S Bao, Y Lin, W Li, P Anantha… - Journal of Materials …, 2017 - cambridge.org
Integration of photonic devices on silicon (Si) substrates is a key method in enabling large
scale manufacturing of Si-based photonic–electronic circuits for next generation systems …

Flat metamorphic InAlAs buffer layer on GaAs (111) A misoriented substrates by growth kinetics control

A Tuktamyshev, S Vichi, F Cesura, A Fedorov… - Journal of Crystal …, 2022 - Elsevier
We have successfully grown, through the detailed control of the growth kinetics, flat InAlAs
metamorphic buffer layers on 2∘-off GaAs (111) A substrates using molecular beam epitaxy …

Investigations of Nanoscale Columnar AlxGa1-xN/AlN Heterostructures Grown on Silicon Substrates with Different Modifications of the Surface

PV Seredin, N Kurilo, DL Goloshchapov, V Kashkarov… - Photonics, 2023 - mdpi.com
The growth of nanoscale columnar AlxGa1-xN/AlN heterostructures on the surface of silicon
substrates using plasma-activated nitrogen molecular-beam epitaxy was investigated in this …