Epitaxial growth, a crystallographically oriented growth induced by the chemical bonding between crystalline substrate and atomic building blocks, has been a key technique in the …
For the first time, a multilayer heterostructure consisting of periodically arranged GaN and AlN layers was formed by chloride-hydride gas-phase epitaxy on a SiC/Si hybrid substrate …
SH Kim, SK Kim, JP Shim, DM Geum… - IEEE Journal of the …, 2018 - ieeexplore.ieee.org
Monolithic 3-D integration has emerged as a promising technological solution for traditional transistor scaling limitations and interconnection bottleneck. The challenge we must …
Problems of the growth of nanoscale columnar Al x Ga 1-x N/AlN heterostructures on hybrid substrates involving porous silicon and silicon carbide layers by molecular beam epitaxy …
Integration of silicon-complementary metal oxide-semiconductor (Si-CMOS) and III-V compound semiconductors (with device structures of either InGaAs HEMT, AlGaInP LED …
Compositionally graded InAlAs buffers grown by metal–organic chemical vapor deposition are impaired by phase separation occurring at In content higher than 35%. Phase …
Integration of photonic devices on silicon (Si) substrates is a key method in enabling large scale manufacturing of Si-based photonic–electronic circuits for next generation systems …
We have successfully grown, through the detailed control of the growth kinetics, flat InAlAs metamorphic buffer layers on 2∘-off GaAs (111) A substrates using molecular beam epitaxy …
The growth of nanoscale columnar AlxGa1-xN/AlN heterostructures on the surface of silicon substrates using plasma-activated nitrogen molecular-beam epitaxy was investigated in this …