F Alema, G Seryogin, A Osinsky, A Osinsky - APL Materials, 2021 - pubs.aip.org
We report on the Ge doping of Ga 2 O 3 using metalorganic chemical vapor deposition
(MOCVD) epitaxy. The effects of the GeH 4/N 2 flow rate, substrate temperature, VI/III ratio …