Despite extensive studies since the 1960s, the exact mechanisms underlying phase
formation of metastable tetragonal beta-Tantalum (β-Ta) structure commonly found in …

An important resource for students, engineers and researchers working in the area of thin
film deposition using physical vapor deposition (eg sputtering) for semiconductor, liquid …

Nanostructured tantalum films with an average grain width of 40–50nm were synthesized
using direct current (DC) magnetron sputtering. The relationship between sputtering …

We comparatively study the elastic properties of the two existing polytypes of tantalum, α-Ta
(ground state bcc structure) and β-Ta (metastable tetragonal structure), using density …

Tantalum coatings were deposited on Ti-13Nb-13Zr alloy by filtered cathodic vacuum arc
deposition in order to improve the alloy's wear and corrosion resistance under load-bearing …

In this study, tantalum thin films were deposited on silicon substrates using high power
impulse magnetron sputtering (HiPIMS) and pulsed DC magnetron sputtering (pulsed DC) …

In this work, the influence of sputter conditions and film thickness on both the morphology
and the resistivity of tantalum (Ta) thin films will be investigated. Glass wafers were used as …

The trackability of tiny endovascular medical implants (TEMIs) during and after surgery is a
crucial parameter for their accurate implantation and after surgery follow-ups. In this work …

The crystallographic properties of tantalum films deposited as a bioactive coating on Co–Cr–
Mo and Ti–Al–Nb alloys have been investigated. The desired tough and ductile alpha phase …

Abstract Large area (A= 6 cm 2), thin tantalum films (5 nm< d< 100 nm) are accomplished by
evaporation from tantalum rods using small pocket e-beam evaporators. Using a sample to …