Silicon is an attractive semiconductor material for wide‐ranging applications, from electronics and sensing to solar cells. Functionalization of H‐terminated silicon surfaces with …
Molecular monolayer doping (MLD) presents an alternative to achieve doping of silicon in a nondestructive way and holds potential for realizing ultrashallow junctions and doping of …
All electronic, optoelectronic or photovoltaic applications of silicon depend on controlling majority charge carriers via doping with impurity atoms. Nanoscale silicon is omnipresent in …
An effective bottom-up technology for precisely controlling the amount of dopant atoms tethered on silicon substrates is presented. Polystyrene and poly (methyl methacrylate) …
Contact doping method for the controlled surface doping of silicon wafers and nanometer scale structures is presented. The method, monolayer contact doping (MLCD), utilizes the …
This article describes for the first time the controlled monolayer doping (MLD) of bulk and nanostructured crystalline silicon with As at concentrations approaching 2× 1020 atoms cm …
Ex-situ doping of 30 nm thick silicon-on-insulator (SOI) substrates is performed by using polymers terminated with a doping containing moiety. Poly (methylmetachrylate) polymers …
F Gao, AV Teplyakov - Applied Surface Science, 2017 - Elsevier
The field of chemical functionalization of semiconductor surfaces has developed tremendously over the last several decades. Since silicon occupied the main portion of the …
M Georgieva, N Petkov, R Duffy - Materials Science in Semiconductor …, 2023 - Elsevier
In this perspectives paper we will explore the doping state-of-the-art as it evolves for 3D to 2D structures and materials, and the following impact on the metrology methods needed to …