Nitride or oxynitride? Elucidating the composition–activity relationships in molybdenum nitride electrocatalysts for the oxygen reduction reaction
Molybdenum nitride (Mo–N) catalysts have shown promising activity and stability for the
oxygen reduction reaction (ORR) in acid. However, the effect of oxygen (O) incorporation …
oxygen reduction reaction (ORR) in acid. However, the effect of oxygen (O) incorporation …
Structural and mechanical properties of chromium nitride, molybdenum nitride, and tungsten nitride thin films
P Hones, N Martin, M Regula… - Journal of Physics D …, 2003 - iopscience.iop.org
Abstract Cr–N, Mo–N, and W–N thin films are deposited on silicon by rf reactive magnetron
sputtering. The crystallographic phase and residual stress are determined by x-ray …
sputtering. The crystallographic phase and residual stress are determined by x-ray …
Effect of nitrogen pressure, bias voltage and substrate temperature on the phase structure of Mo–N coatings produced by cathodic arc PVD
MK Kazmanli, M Ürgen, AF Cakir - Surface and Coatings Technology, 2003 - Elsevier
In this study, the effect of nitrogen pressure, bias voltage and the substrate temperature on
the structure of Mo–N coatings produced by arc PVD was investigated. High speed steel …
the structure of Mo–N coatings produced by arc PVD was investigated. High speed steel …
Dislocation-pipe diffusion in nitride superlattices observed in direct atomic resolution
Device failure from diffusion short circuits in microelectronic components occurs via
thermally induced migration of atoms along high-diffusivity paths: dislocations, grain …
thermally induced migration of atoms along high-diffusivity paths: dislocations, grain …
Deposition of molybdenum nitride thin films by rf reactive magnetron sputtering
VP Anitha, S Major, D Chandrashekharam… - Surface and Coatings …, 1996 - Elsevier
Molybdenum nitride thin films were prepared by the reactive rf magnetron sputtering
technique, on grounded substrates, using nitrogen as reactive gas. The effect of the variation …
technique, on grounded substrates, using nitrogen as reactive gas. The effect of the variation …
Synthesis, Characterization, and Single-Crystal X-ray Structures of Refractory Metal Compounds as Precursors for the Single-Source Chemical Vapor Deposition of …
The chemical vapor deposition of refractory metal nitrides requires volatile precursors and
has previously been achieved by using metal complexes containing a variety of imide …
has previously been achieved by using metal complexes containing a variety of imide …
Amorphous molybdenum nitride thin films prepared by reactive sputter deposition
Y Wang, RY Lin - Materials Science and Engineering: B, 2004 - Elsevier
Amorphous molybdenum nitride thin films were prepared by pulsed direct current (dc)
reactive sputter deposition. The effect of the sputtering gas nitrogen content on the structure …
reactive sputter deposition. The effect of the sputtering gas nitrogen content on the structure …
Characterization of molybdenum nitride coatings produced by arc-PVD technique
M Ürgen, OL Eryilmaz, AF Çakir, ES Kayali… - Surface and Coatings …, 1997 - Elsevier
Molybdenum nitride coatings were deposited onto high-speed steel (HSS) substrates by the
arcPVD technique. It was possible to produce coatings with Mo2N and MoN structure by …
arcPVD technique. It was possible to produce coatings with Mo2N and MoN structure by …
Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive RF magnetron discharge
B Bouaouina, A Besnard, SE Abaidia, A Airoudj… - Surface and Coatings …, 2018 - Elsevier
Molybdenum nitride thin films were deposited on (100) silicon substrates by RF magnetron
sputtering of a Mo target in a (Ar-N 2) gas mixtures. The films were studied by Scanning …
sputtering of a Mo target in a (Ar-N 2) gas mixtures. The films were studied by Scanning …
Sputter-deposited Mo and reactively sputter-deposited Mo-N films as barrier layers against Cu diffusion
JC Chuang, SL Tu, MC Chen - Thin Solid Films, 1999 - Elsevier
This work studied the barrier capability of sputter-deposited Mo and reactively sputter-
deposited Mo-N layers against Cu diffusion in a device structure of Cu/barrier/p+ n junction …
deposited Mo-N layers against Cu diffusion in a device structure of Cu/barrier/p+ n junction …